Summary Abstract: Experiments on ultrathin Al overlayers on GaAs(110) (original) (raw)

1983, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

We investigated the adatom states for different AI coverages ofInP(110) by synchrotron-radiation photoemission, including ultralow coverages below 0.2 monolayer. The adatom states below 0.1 monolayer and above-3 monolayer appear similar to the corresponding Al-adatom states on GaAs(110). In particular, the results for both systems appear consistent with the formation of Al clusters at 0.1-2 monolayer coverage, and the Fermi-level pinning occurs when the cluster formation starts. However, the similarity between the two systems is limited at intermediate (0.1-2 monolayer) coverages. At those coverages we observe a new bonded state for Ai on InP, which is not observed on GaAs. Our results emphasize, in general, the need to extend the experiments to ultralow coverages when studying the Schottky barrier formation process.

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Atomic interdiffusion at Au-GaAs interfaces studied with Al interlayers

Physical Review B, 1981

We have used soft-x-ray photoemission spectroscopy at Au/GaAs interfaces to determine the movement of Au, Ga, and As atoms during the initial stages of Schottky-barrier formation. Studies of core-level features obtained with a range of photon energies between 80 and 250 eV indicate that, at room temperature, Au atoms first diffuse into GaAs, followed by the nonstoichiometric outdiffusion of Ga and As into Au overlayers. Thin Au overlayers on GaAs promote a spatial distribution of dissociated Ga and As which depends on the overlayer thickness, These microscopic phenomena result in a local charge redistribution which determines the electronic properties of the macroscopic Au/GaAs junction. We discuss the application of Al atoms at the intimate metal-semiconductor interface either as immobile markers to establish the absolute motion of interface species on an atomic scale or as indicators of the overall interface motion.

Schottky barrier formation for In deposited on GaAs(110): the low coverage limit

Applied Surface Science, 1993

An ab-initio LCAO method is used to calculate the electronic properties of different low coverages of indium deposited on GaAs(ll0). Results for a monolayer, half a monolayer, a quarter of a monolayer and the isolated indium atom are presented. Chemisorption energies and the most favourable adsorption sites are calculated for each case. The interface Fermi energy and the Schottky barrier formation are discussed as a function of the metal coverage.

The Structure of Al/GaAs Interfaces

MRS Proceedings, 1986

ABSTRACTThe structure of Al/GaAs interfaces was investigated by high resolution electron microscopy. The Al layers Were deposited in a molecular beam epitaxy chamber with a vacuum base pressure of <1×10∼8 Pa. The GaAs substrate temperature varied during Al deposition from -30°C to 400°C. Deposition of Al on cold substrates £25°C resulted in epitaxial growth of (001) Al on (001) GaAs. Droplets of Ga were observed in samples with the substrate temperature at -30°C (1×2) and 0°C (c(2×8)). Postannealing of the last sample caused formation of the AlGaAs phase. Deposition of Al on hot substrates (150°C and 400°C) resulted in the formation of the AlGaAs phase, which separated (110) oriented Al from (001)GaAs.

As overlayer on GaAs(110) studied with photoemission

Physical Review B, 1995

As-terminated GaAs(110) surfaces were prepared on ex situ cleaved substrates by molecular-beam epitaxy. The surface stoichiometry was controlled by postgrowth As deposition. Photoemission from a surface covered with a monolayer As was investigated in detail using synchrotron radiation. Two different surface components were found in core-level spectra, which are interpreted as due to adatoms bonding to the surface anions and cations. In the valence-band spectra several surface states were identified, in analogy with previous reports on the isoelectronic Sb/GaAs(110) system. The polarization dependence is not the same, however, which leads us to the conclusion that the adlayer bonding mechanisms are different in the two cases.

The kinetics of Schottky barrier formation: Al on low-temperature GaAs(110)

Solid State Communications, 1986

The deposition of AI on both low-temperature and room-temperature cleaved GaAs(110) substrates results in A1-Ga exehange and in some AI clusterization. In contrast, the kinetics of the Shottky barrier formation process is dramatically different for low-and room-temperature substrates. This requires substantial modifications of the barrier formation model deduced from room-temperature experiments.

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