Extending the resolution limits of nanoshape imprint lithography using molecular dynamics of polymer crosslinking (original) (raw)
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Polymer Imprint Lithography with Molecular-Scale Resolution
Nano Letters, 2004
We show that small diameter, single-walled carbon nanotubes can serve as templates for performing polymer imprint lithography with feature sizes as small as 2 nm − comparable to the size of an individual molecule. The angstrom level uniformity in the critical dimensions of the features provided by this unusual type of template provides a unique ability to investigate systematically the resolution of imprint lithography at this molecular scale. Collective results of experiments with several polymer formulations for the molds and the molded materials suggest that the density of cross-links is an important molecular parameter that influences the ultimate resolution in this process. Optimized materials enable reliable, repetitive patterning in this single nanometer range.
Processing dependent behavior of soft imprint lithography on the 1-10-nm scale
IEEE Transactions on Nanotechnology, 2006
This paper examines aspects of a soft nanoimprint lithography technique for operation at resolutions that approach the 1-nm regime. Systematic studies using polymer molds made with single walled carbon nanotubes (diameters between 0.5 and 5 nm) and high-resolution electron beam patterned layers of hydrogen silsesquioxane (line widths and heights 10 and 20 nm, respectively) as templates reveal a dependence of the resolution limits on the polymer processing conditions. In particular, using a single choice of polymers for the molds and the molded materials, imprint results show that the conditions for spin casting and curing the polymers determine, to a large degree, the resolution and replication fidelity that can be achieved. Optimized procedures enable imprinted polymer surfaces that have a root mean squared surface roughness of 0.26 nm or lower and a resolution as high as 1 nm. These characteristics are significantly better than previous results obtained using these same polymers with unoptimized conditions. A diversity of molded polymers, including Bisphenol-F epoxy resin, polyacrylic acid, and polyurethane, show similar high-fidelity imprinting capabilities. Different procedures enable accurate relief replication for features with modest aspect ratios and dimensions of 10 nm. The results indicate that choice of processing conditions is, in addition to materials selections, extremely important in achieving high-fidelity soft nanoimprint lithography in the 1-10-nm regime.
3D Simulation of Nano-Imprint Lithography
Nanoscale Research Letters, 2010
A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have followed the line initiated by de Gennes, using a Molecular Stress Function model of the Doi and Edwards type. We have used a 3D Lagrangian Galerkin finite element methods implemented on a parallel computer architecture. In a Lagrangian techniques, the node point follows the particle movement, allowing for the movement of free surfaces or interfaces. We have extended the method to handle the dynamic movement of the contact line between the polymer melt and stamp during mold filling.
Nano patterning and Nanoimprint lithography [NIL] has advanced to great heights in recent years. Customizing the surface at micro and nano scale is of great demand. It facilitates the handling and working at micro and nano scale level. Its applications towards medical field are growing day by day. Precise surface patterning with nanometer resolution has great potential in many medical and biological applications. It also provides a platform for fundamental studies of molecular and cell biology. This review article comprises of current trends and future scope of nano patterning and NIL. In this article we particularly focus on biological applications.
Recent Advances in Nano Patterning and Nano Imprint Lithography for Biological Applications
Procedia Engineering, 2014
Nano patterning and Nanoimprint lithography [NIL] has advanced to great heights in recent years. Customizing the surface at micro and nano scale is of great demand. It facilitates the handling and working at micro and nano scale level. Its applications towards medical field are growing day by day. Precise surface patterning with nanometer resolution has great potential in many medical and biological applications. It also provides a platform for fundamental studies of molecular and cell biology. This review article comprises of current trends and future scope of nano patterning and NIL. In this article we particularly focus on biological applications.
Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology
Journal of Photopolymer Science and Technology, 2002
The goal of the SFIL development program is to enable patterning of sub-100 nm features at room temperature and with minimal applied pressure. We believe the use of low viscosity materials and photopolymerization chemistry will enable SFIL to achieve the throughput required for use in the microelectronics industry. Additionally, the rigid transparent imprint template used in SFIL enables a precision in overlay alignment that is difficult to achieve in other imprint schemes. Previous work demonstrated the ability to use SFIL to pattern over existing topography, to pattern on curved surfaces, and to produce working simple optical devices. Studies of defectivity have not revealed significant defect generation, and in fact have revealed no catastrophic defect propagation. Recent work has focused on improving etching processes used to amplify the aspect ratio of the polymer features. With this recent work we have demonstrated polymer-on-Si semi-dense lines smaller than 50 nm made with the SFIL process.
Nanoscale molecular-switch devices fabricated by imprint lithography
Applied Physics Letters, 2003
Nanoscale molecular-electronic devices comprising a single molecular monolayer of bistable ͓2͔rotaxanes sandwiched between two 40-nm metal electrodes were fabricated using imprint lithography. Bistable current-voltage characteristics with high on-off ratios and reversible switching properties were observed. Such devices may function as basic elements for future ultradense electronic circuitry.
Improved step and flash imprint lithography templates for nanofabrication
Microelectronic Engineering, 2003
Step and flash imprint lithography (SFIL) is an attractive method for printing sub-100 nm geometries. Relative to other imprinting processes, SFIL has the advantage that the template is transparent, thereby facilitating conventional overlay techniques. In addition, the imprint process is performed at low pressures and room temperature, which minimizes magnification and distortion errors. Several different methods for fabricating templates are presented in this study. One scheme addresses some of the weaknesses associated with a solid glass substrate by incorporating a conductive and transparent layer of indium tin oxide (ITO) on the surface of the substrate. Features are defined on the templates by patterning a thin layer of PECVD oxide that is deposited on the ITO layer. A second method bypasses the oxide etch process by imaging a thin layer of hydrogen silsesquioxane (HSQ). By using a combination of these two methods, it is also possible to form multi-tiered structures on a template. Templates with features as small as 20 nm have been fabricated using the methods described above. The templates were then used to imprint patterns on 200 mm silicon wafers. It appears that any feature defined in the template is faithfully replicated on the wafer.