Properties of magnetron-sputtered electrically insulating Al2O3 coatings on copper (original) (raw)
1992, Journal of Materials Science
Amorphous AI203 coatings were deposited on Cu substrates with metallic bond layers by different magnetron-sputtering processes. Such sputtering conditions as the type of discharge, target material, total pressure, sputtering gas composition and substrate temperature were varied to study the process effects on the structure and properties of the coatings deposited. The structure and general properties were found to be strongly dependent on the type of process and parameters. The breakdown voltages did not show any significant lowering as the temperature was increased from 20 to 400-500 ~ The maximum temperature without formation of cracks in the AI203 coating on Cu was about 700~ The d.c. electrical conductivities of the AI203 were similar to that of bulk AI203 at different temperatures. The results reveal the potential use of magnetron-sputtered AIz03 coatings on Cu for electrical insulation and oxidation protection in different high-temperature applications, e.g. on metallic magnetohydrodynamic electrode and insulator modules.
Sign up for access to the world's latest research.
checkGet notified about relevant papers
checkSave papers to use in your research
checkJoin the discussion with peers
checkTrack your impact
Loading Preview
Sorry, preview is currently unavailable. You can download the paper by clicking the button above.