Comparative characterization of alumina coatings deposited by RF, DC and pulsed reactive magnetron sputtering (original) (raw)
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With the use of AFM, nanohardness and elastic modulus measuring, as well as measurements of the forces of cohesion, friction coefficient by means of a scratch test, oxide coatings of Al2O3, obtained by magnetron sputtering of Al were investigated. The hardness of the coating Al2O3, nanostructured film deposited on TiN, increased as compared with the coating deposited on steel. A comparison of the morphology of samples obtained by reactive magnetron sputtering synthesis and a source of RF plasma using oxygen ions was carried out. The mechanical characteristics of hardness, elastic modulus, adhesion strength and friction coefficient of obtained coatings were investigated.
Surface & Coatings Technology, 1997
Investigations concerning the microstructure and mechanical properties of alumina coatings have been performed. Alumina coatings have been deposited by both ionized reactive magnetron sputtering (l&B) and conventional reactive magnetron sputtering (CMS) in an argon/ oxygen discharge onto stainless-steel coated silicon substrates. X-Ray diffraction (XRD) was used for the phase analysis, and nanoindentation was used to evaluate the mechanical properties. Substrate temperature during deposition was <5OO"C, which is the technologically interesting temperature range to coat temperature sensitive substrates such as tool steels. The phase transformation temperatures from amorphous to K-alumina containing films was found to be between 43O'C and 472'C, and the transition temperature was lower for higher ion currents. A film containing a mixture of K-and B-alumina phases was grown at 430°C. The crystalline film hardness was 22 k 1 GPa.
Crystalline alumina coatings by reactive AC magnetron sputtering
Alumina coatings were deposited on silicon ͑111 orientation͒ substrates by reactive ac magnetron sputtering. Film deposition was done using Al targets and three O 2 / Ar gas flow rate ratios at 5 kW power. X-ray diffraction studies showed that films were crystalline and contained several phases of alumina. Secondary ion mass spectroscopy analyses were used to measure O / Al atomic ratio and Ar and H concentrations in the films. Hydrogen content in the coatings depended on the O 2 partial pressure used during sputtering and also on the arrival rate of Al and O species on the substrates and seemed to influence the crystallinity of the coatings.
Effects of thermal annealing on the microstructure of sputtered Al2O3 coatings
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The morphology and microstructure of Al 2 O 3 thin films deposited by pulsed direct current magnetron sputtering were studied in the as-grown state and after vacuum annealing at 1000 C for 12 h using transmission electron microscopy. For the coating deposited under low ion bombardment conditions, the film consists of small cand/or d-Al 2 O 3 grains embedded in an amorphous matrix. The grain size at the region close to the interface to the substrate was much larger than that of the remaining layer. Growth of the c-Al 2 O 3 phase is promoted during annealing but no transformation to a-Al 2 O 3 was detected. For high-energetic growth conditions, clear evidence for c-Al 2 O 3 formation was found in the upper part of the coating with grain size much larger than for lowenergetic growth, but the film was predominately amorphous at the interface region. Annealing resulted in the transformation of c-Al 2 O 3 to a-Al 2 O 3 , while the mainly amorphous part crystallized to c-Al 2 O 3. V
Nanocrystalline γ-Al2O3 thin film deposited by magnetron sputtering (MS) at low temperature
Journal of Coatings Technology and Research, 2010
This article presents some experimental data indicating the possibility of depositing nanocrystalline c-Al 2 O 3 thin films on 304L stainless steel, at low temperatures, using magnetron sputtering (MS) in a reactive atmosphere (O 2 ). The experimental conditions are defined, while the coat layer is characterized and first results on its wear behavior are presented.
Alumina Thin film Coatings at Optimized Conditions using RF Magnetron Sputtering Process
International Journal of Thin Films Science and Technology, 2021
This study deals with the extensive investigation of Alumina thin film coating deposited on glass, stainless steel, and polycarbonate substrates at 25ºC. The transmittance, reflectance, and surface roughness were determined. Transmittance was observed from 88 to 91 % for alumina thin film coating on glass and polycarbonate substrates. The stiffness, hardness, and elastic modulus were 58, 52, and 47 μN/nm, 7.52, 7.14, 6.87, 103, 112, and 122 GPa thin-film coating on different substrates. An increase in surface roughness and transmittance was observed with sputtering power and the thickness of the coating.
Reactive dc magnetron sputter deposited Al2O3: large area coatings for industrial application
Surface and Coating Technology, 1999
O 3 films are produced with a pure Al source in the metallic state in an O 2 +Ar gas mixture using reactive d.c. magnetron sputtering. Substrates as large as 70×100 cm2 are uniformly coated at room temperature while moving in front of the cathode. The key to the success lies in utilizing a sufficiently high working gas pressure and a sufficiently large source-tosubstrate distance. Monte Carlo simulations are used to estimate the latter. The process is extremely stable, and despite the large target size, no arcing is detected.
Surface and Coatings Technology, 1999
Stoichiometric Al 2 O 3 films are produced with a pure Al source in the metallic state in an O 2 +Ar gas mixture using reactive d.c. magnetron sputtering. Substrates as large as 70×100 cm2 are uniformly coated at room temperature while moving in front of the cathode. The key to the success lies in utilizing a sufficiently high working gas pressure and a sufficiently large source-tosubstrate distance. Monte Carlo simulations are used to estimate the latter. The process is extremely stable, and despite the large target size, no arcing is detected.