Study of Development Processes for ZEP-520 as a High-Resolution Positive and Negative Tone Electron Beam Lithography Resist (original) (raw)

Japanese Journal of Applied Physics, 2012

K. Koshelev

David Zheng

Mohammad Mohammad

Steven Dew

Maria Stepanova

Ali Mohammad

Abstract

Abstract ZEP brand electron beam resists are well-known for their high sensitivity and etch durability. The various performance metrics such as sensitivity, contrast, and resolution of ZEP resist depend strongly on the development process. In this work, we investigate the ...

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