Сопоставление физико-химических свойств нитридных пленок, полученных разными методами реактивного распыления (original) (raw)

Сопоставление физико-химических свойств нитридных пленок, полученных разными методами реактивного распыления

2013

Abstract

Improvement of physical, mechanical and chemical properties of thin nitride films depends on the methods of their deposition and improvement of the structure, which determines the obtained properties. In the production of nitride films, which are promising in solid-state microelectronics and instrument engineering, various reactive sputtering methods are widely used. For the solution of these problems, relatively new methods - ion implantation method (II) and condensation and ion bombardment (CIB) method, carried out on the "Bulat" in stallation are quite promising. However, films, obtained by various methods using the same initial materials, as a rule, have various characteristics. In this paper, the films of nitrides on Ti, Ta, W, Mo, Ni, Si (111) and NaCl (100) substrates were obtained by the above methods, their physical, electrical and chemical characteristics were studied. The kinetics and mechanism of build-up of the obtained film coatings were established, the grow...

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