Use of angle resolved x-ray photoelectron spectroscopy for determination of depth and thickness of compound layer structures (original) (raw)

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2001

Abstract

... with respect to the surface, K is an instrumental constant taking into account the mea-surement time, the collection efficiency of the analyzer, sample roughness, etc., F(θ) is the effective flux of incident x-ray radiation mea-sured as photons ... Fi(θ) ARi(θ) ΣiARi(θ) 0 ni(u)e udu, (3a) ...

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