High repetition rate XUV laser source based on OPCPA for photoemission electron microscopy applications (original) (raw)
High repetition rate XUV laser source based on OPCPA for photoemission electron microscopy applications
Research in Optical Sciences, 2014
A. LhuillierAbstract
ABSTRACT We present a 200 kHz XUV source driven by an optical parametric chirped pulse amplification system. The advantage for photoemission electron microscopy of this high-repetition rate will be discussed.
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