Limits to Nanopatterning Based on E-Beam Lithography (original) (raw)

Pavol Nemec

2014

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4 pages

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Ivan Kostič, Nikolaos Glezos, Anna Konecnikova, Ladislav Matay, Pavol Nemec Pavol Pisecny, Dimitrios Velessiotis 1 Institute of Informatics, Slovak Academy of Sciences, Dúbravská cesta 9, 84507 Bratislava, Slovakia 2 International Laser Centre, Ilkovicova 3, 841 04 Bratislava 4, Slovakia 3 Institute of Microelectronics, National Center of Scientific Research Demokritos, Ag. Paraskevi, Athens 15310, Greece E-mail: ivan.kostic@savba.sk