Characterization of nanodefects in silicon wafers by white light phase shifting interferometry (original) (raw)

SPIE Proceedings, 2003

Abstract

Silicon wafers are widely used in semiconductor and microelectronics industries. With this material, there is an immense need to obtain defect free highly polished surface for improved yield and performance of the micro-components. The Semiconductor Industry Association's (SIA) International Technology Roadmap specifies that by 2005, 30 nm particles must be detectable on bare silicon and non-metallic films, 39 nm particles

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