Surface coating on the cylinder rod using sputtering deposition method with modulated magnetic field (original) (raw)
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IOP Conference Series: Materials Science and Engineering
Carbon rods of battery were utilized as a target in a plasma sputtering deposition of a carbon thin film. The rods were taken from unused battery waste containing some impurities. This study was intended to investigate the effect of the impurities on the resulted thin film. Furthermore, this work aimed to study the utilization of an unconventional sputtering technique to deposit the carbon film on glass substrates. A low-frequency plasma generator of 40 kHz was used to power the sputtering reactor. The plasma was generated from an Argon gas in a medium vacuum pressure. Two deposition parameters studied in this work were plasma power varied from 220 watts to 360 watts and substrate temperature varied from 25 o C to 202 o C. The carbon target in this research was also functioned as an electrode in the sputtering system. The deposition process was carried out for 1 hour to produce a reasonably thick carbon thin film. The resulted films were characterized using a Fourier Transform Infrared (FTIR) spectroscopy. The FTIR spectra showed a distinct peak around 1200 cm-1 and 1600-1700cm-1 related to the CC and C=C vibration respectively. The relatively broad peak consisted of a doublet indicating a complex structure of the carbon film, presumably an amorphous carbon film. It was proven that impure carbon could be used as the target and successfully deposited on the glass substrate.
Characteristics of Carbon Films Deposited by Magnetron Sputtering
Acta Physica Polonica A, 2009
Carbon thin films are often called in the literature, "diamond-like carbon" films. They consist of two basic allotropic forms of carbon, which are graphite and diamond. Carbon atoms with sp 2 bonds form after deposition of a graphite-like phase. Atoms with sp 3 bonds form a diamond-like phase. Diamond-like crystallites are built into a graphite-like phase matrix. In this paper there are presented experimental results of deposition of carbon films by the magnetron sputtering method and the results of analysis of the surface and phase structures of the deposited films. The amorphous carbon films were deposited from graphite targets on 316L steel substrates. The films were deposited at room temperature, in vacuum. The deposition time was 3 h; the depositions were conducted at two different distances between the substrate and the magnetron target.
Surface and Coatings Technology, 2014
Because of the problem of film peeling, it is generally difficult to obtain thick and well adherent diamond-like carbon (DLC) coatings on metallic substrates with good tribological properties. In this work, we propose to apply a plasma immersion ion implantation and deposition (PIII&D) process in magnetic bottle configuration using high voltage glow discharge in order to deposit DLC films directly over 304 stainless steel (SS) alloy. In such configuration, two couples of coils wound outside the vacuum chamber are used to produce region of low magnetic field for plasma confinement (~60 G at the center axis). DLC coatings are characterized by Raman spectroscopy, scanning electron microscopy (SEM) and also morphologically by means of atomic force microscopy (AFM). Tribological behavior is investigated using a pin-on-disk tribometer, and after that, the scars are evaluated by means of SEM and Wyko NT1100 optical profiler. PIII&D experiments in crossed fields have been demonstrated to be an effective system to synthesize DLC films with good adhesion, excellent resistance against wear as well as good dry lubricant surfaces.
Growth effects in carbon coatings deposited by magnetron sputtering
Surface and Coatings Technology, 2003
Hard amorphous carbon (a-C) coatings were deposited by DC magnetron sputtering from graphite targets by applying different growth conditions. Depending on the process parameters special growth effects and morphologies were observed and analysed by scanning electron microscopy. The constitution and selected properties of the coatings were characterised by Raman spectroscopy, and by measurements of the Vickers hardness and the critical load of failure in the scratch test. A method for the high-rate deposition of hard a-C coatings (Vickers hardness up to 1400 HV , deposition rate up to 1 mmyh, thickness up to 5 mm) with 0.05 a very low defect density, and dominated mainly by sp-bondings, is presented. The properties and the morphology of the coatings 2 are discussed with respect to the applied growth conditions.
Diamond and Related Materials, 2004
Comparison is made between films deposited onto metal and silicon substrates with variable thickness via PECVD, hydrogenfree filtered cathodic vacuum arc (FCVA) and unbalanced magnetron sputtering (UBMS). Raman spectroscopy, nanoindentation and Kelvin probe (for work function) were used to analyse the quality, structure, surface morphology and electrical properties of the films. The Raman I yI ratio ranged from 0.1 to 1.6, depending on substrate material, thickness and deposition technique. d g Relative work functions of FCVA and PECVD films were lower than those of UBMS films. UBMS films have, what appears to be an amorphous sp carbon structure across the thickness range while PECVD and FCVA indicate an initial growth layer, up to 2 20 nm, that differs in sp -content compared to thicker films, due to the influence of the substrate. In the former, this initial layer 3 is characteristic of a polymeric high sp a-C:H film but as the film thickness increases a harder film forms. FCVA films show a 3 small but increasing sp -content and growth rate as thickness increases, suggesting a lower subplantation effectiveness into the 3 substrate compared to a-C. ᮊ
Modifications of radiofrequency capacitive discharge for deposition of carbon coatings
2002
This thesis is an investigation of modifications of RF excited discharge for deposition of carbon coatings. Two separate discharge configurations were examined: an RF capacitive discharge with electron injection and removal by means of an emissive filament and a DC electrode, and an RF discharge with a hollow cathode powered electrode. Plasma characterization was conducted by means of an electrostatic probe and an energy and mass analysis probe. Interpretation of the electrostatic probe data in presence of RF harmonics in plasma has been discussed. <br>Electron injection and removal has been found to control strongly plasma potential and maximum of ion energy at the grounded electrode, reducing them to less than 10 V or increasing above 90 V accordingly. Related changes of electron temperature and density have been measured, with plasma density being increased up to an order of magnitude by electron injection. This effect has been linked with a regime, when hot filament instig...
Journal of Nanoscience and Nanotechnology, 2009
A new, low cost, pulsed-DC plasma-enhanced chemical vapor deposition system that uses a bipolar, pulsed power supply was designed and tested to evaluate its capacity to produce quality diamondlike carbon films on the inner surface of steel tubes. The main focus of the study was to attain films with low friction coefficients, low total stress, a high degree of hardness, and very good adherence to the inner surface of long metallic tubes at a reasonable growth rate. In order to enhance the diamond-like carbon coating adhesion to metallic surfaces, four steps were used: (1) argon ion sputtering; (2) plasma nitriding; (3) a thin amorphous silicon interlayer deposition, using silane as the precursor gas; and (4) diamond-like carbon film deposition using methane atmosphere. This paper presents various test results as functions of the methane gas pressure and of the coaxial metal anode diameter, where the pulsed-DC voltage constant is kept constant. The influence of the coaxial metal anode diameter and of the methane gas pressure is also demonstrated. The results obtained showed the possibilities of using these DLC coatings for reduced friction and to harden inner surface of the steel tubes.