Burn-in oven (original) (raw)
Burn-in ovens in electronics device fabrication, are designed for dynamic and static burn-in of integrated circuits and other electronic devices, including laser diodes. Typical sizes are from under ten to over 30 cubic feet (0.85 m3), with air or nitrogen configurations. Operating temperatures can go over 260 °C (500 °F), and can use both single and multiple temperature settings. Burn-in ovens are considered a type of batch oven. Other types of batch ovens are bench/laboratory, reach-in, walk in/truck in, and clean process.
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dbo:abstract | Burn-in ovens in electronics device fabrication, are designed for dynamic and static burn-in of integrated circuits and other electronic devices, including laser diodes. Typical sizes are from under ten to over 30 cubic feet (0.85 m3), with air or nitrogen configurations. Operating temperatures can go over 260 °C (500 °F), and can use both single and multiple temperature settings. Burn-in oven applications can be used in numerous different applications such as high-dissipation forward bias, high-temperature reverse bias, dynamic and static burn-in of microprocessors and other semiconductor devices. Burn-in ovens are considered a type of batch oven. Other types of batch ovens are bench/laboratory, reach-in, walk in/truck in, and clean process. One company builds systems designed for burn-in of low power laser diodes up to 1A and high power laser diodes up to 300A. (en) |
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rdfs:comment | Burn-in ovens in electronics device fabrication, are designed for dynamic and static burn-in of integrated circuits and other electronic devices, including laser diodes. Typical sizes are from under ten to over 30 cubic feet (0.85 m3), with air or nitrogen configurations. Operating temperatures can go over 260 °C (500 °F), and can use both single and multiple temperature settings. Burn-in ovens are considered a type of batch oven. Other types of batch ovens are bench/laboratory, reach-in, walk in/truck in, and clean process. (en) |
rdfs:label | Burn-in oven (en) |
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