Sergiy Yulin - Academia.edu (original) (raw)
Papers by Sergiy Yulin
Optics Communications, Jun 1, 2008
Optical Interference Coatings 2016, 2016
Proceedings of Spie the International Society For Optical Engineering, Apr 1, 2006
Most applications of Mo/Si multilayer optics in EUV lithographic systems require a high normal-in... more Most applications of Mo/Si multilayer optics in EUV lithographic systems require a high normal-incidence reflectivity. Using dc-magnetron sputtering we achieved R = 68.8% at the wavelength of 13.5 nm. Different interface-engineered Mo/X/Si/X multilayers with a maximum reflectivity of 69.6% were developed. These new multilayer mirrors consist of molybdenum and silicon layers separated by different interdiffusion barriers (X = C and SiC). The Mo/C/Si/C interface-engineered mirrors were optimized in terms of high peak reflectivity at a wavelength near 13.5 nm (R p P 60.0%) and broad operating temperature range (T = 20-500°C). The best results were obtained with 0.8 nm thicknesses of carbon interlayers on both interfaces. The combination of good optical properties and high thermal stability of interface-engineered Mo/C/Si/C multilayer mirrors underlines their potential for their use in EUV optics.
Microelectronic Engineering, Apr 1, 2006
According to the optics requirements of an EUVL tool, the accurate deposition of high reflective ... more According to the optics requirements of an EUVL tool, the accurate deposition of high reflective and laterally graded multilayers on ultraprecise polished substrates can be regarded as one of the major challenges of EUV lithography development today. To meet ...
Proceedings of Spie the International Society For Optical Engineering, 2010
Proceedings of Spie the International Society For Optical Engineering, Mar 10, 2006
The EUV source output power and the collector optics lifetime have been identified as critical ke... more The EUV source output power and the collector optics lifetime have been identified as critical key issues for EUV lithography. In order to meet these requirements a heated collector concept was realized for the first time. An ellipsoidal collector substrate with an outer diameter of ...
Proceedings of Spie the International Society For Optical Engineering, Mar 14, 2008
The lifetime of Mo/Si multilayer-coated projection optics is one of the outstanding issues on the... more The lifetime of Mo/Si multilayer-coated projection optics is one of the outstanding issues on the road of commercialization of extreme-ultraviolet lithography (EUVL). The application of Mo/Si multilayer optics in EUVL requires both sufficient radiation stability and also the highest possible normal-incidence reflectivity. A serious problem of conventional high-reflective Mo/Si multilayers capped by silicon is the considerable degradation of reflective properties
Modern Technologies in Space- and Ground-based Telescopes and Instrumentation II, 2012
ABSTRACT Optical coatings are an integral part of superior optical components. Astronomical appli... more ABSTRACT Optical coatings are an integral part of superior optical components. Astronomical applications (ground- and space-based) place especially high demands on these coatings, not only with regard to their optical performance but also to their mechanical and environmental stability, their thermal properties, and their radiation resistance. This article presents a short overview of several coating solutions developed in recent years at Fraunhofer IOF in order to meet the challenging demands of astronomical applications. The focus is placed on high reflective coatings for different wavelength regions including coatings for the VUV range below 100nm, coatings for the DUV wavelength range above 100nm and VIS/NIR/IR coatings. Further, amorphous silicon layers will be introduced which can be polished to very low roughness values and therefore can act as polishing layer for the manufacture of ultraprecise optical components from metal substrates.
Laser-Induced Damage in Optical Materials: 2004, 2005
The paper proposes to review briefly steps of classical experimental progress towards resistant V... more The paper proposes to review briefly steps of classical experimental progress towards resistant VUV-XUV coatings. It intends to address some of the new challenges of the VUV-XUV radiation resistant coatings, including material investigations, manufacturing, characterizations and active optical components.
Optical Interference Coatings, 2007
The demand to enhance the optical resolution and to structure ever smaller details, has pushed th... more The demand to enhance the optical resolution and to structure ever smaller details, has pushed the optics development in recent years. Mainly induced by the production of more powerful electronic circuits with the aid of projection lithography, an increasing interest is directed towards ...
Advanced Microlithography Technologies, 2005
Most applications of Mo/Si multilayer optics in Extreme ultraviolet lithography (EUVL) require a ... more Most applications of Mo/Si multilayer optics in Extreme ultraviolet lithography (EUVL) require a high normal incidence reflectivity. Using dc magnetron sputtering we achieved R = 68.8 % @ lambda = 13.45 nm. High-reflective Mo/Si/C and high-temperature stable Mo/C/Si/C multilayer mirrors with reflectivity of 69.6 % and 61.0 % at 13.5 nm were developed. Microstructure and optical properties of the multilayers
Emerging Lithographic Technologies XII, 2008
Advances in X-Ray/EUV Optics, Components, and Applications, 2006
The application of multilayer optics in EUV lithography requires not only the highest possible no... more The application of multilayer optics in EUV lithography requires not only the highest possible normal-incidence reflectivity but also a long-term thermal and radiation stability at operating temperatures. This requirement is most important in the case of the collector mirror of the illumination system close to the EUV source where a short-time decrease in reflectivity is most likely. Mo/Si multilayer mirrors,
Advances in X-Ray/EUV Optics and Components II, 2007
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, 2004
Emerging Lithographic Technologies VII, 2003
Optics Communications, Jun 1, 2008
Optical Interference Coatings 2016, 2016
Proceedings of Spie the International Society For Optical Engineering, Apr 1, 2006
Most applications of Mo/Si multilayer optics in EUV lithographic systems require a high normal-in... more Most applications of Mo/Si multilayer optics in EUV lithographic systems require a high normal-incidence reflectivity. Using dc-magnetron sputtering we achieved R = 68.8% at the wavelength of 13.5 nm. Different interface-engineered Mo/X/Si/X multilayers with a maximum reflectivity of 69.6% were developed. These new multilayer mirrors consist of molybdenum and silicon layers separated by different interdiffusion barriers (X = C and SiC). The Mo/C/Si/C interface-engineered mirrors were optimized in terms of high peak reflectivity at a wavelength near 13.5 nm (R p P 60.0%) and broad operating temperature range (T = 20-500°C). The best results were obtained with 0.8 nm thicknesses of carbon interlayers on both interfaces. The combination of good optical properties and high thermal stability of interface-engineered Mo/C/Si/C multilayer mirrors underlines their potential for their use in EUV optics.
Microelectronic Engineering, Apr 1, 2006
According to the optics requirements of an EUVL tool, the accurate deposition of high reflective ... more According to the optics requirements of an EUVL tool, the accurate deposition of high reflective and laterally graded multilayers on ultraprecise polished substrates can be regarded as one of the major challenges of EUV lithography development today. To meet ...
Proceedings of Spie the International Society For Optical Engineering, 2010
Proceedings of Spie the International Society For Optical Engineering, Mar 10, 2006
The EUV source output power and the collector optics lifetime have been identified as critical ke... more The EUV source output power and the collector optics lifetime have been identified as critical key issues for EUV lithography. In order to meet these requirements a heated collector concept was realized for the first time. An ellipsoidal collector substrate with an outer diameter of ...
Proceedings of Spie the International Society For Optical Engineering, Mar 14, 2008
The lifetime of Mo/Si multilayer-coated projection optics is one of the outstanding issues on the... more The lifetime of Mo/Si multilayer-coated projection optics is one of the outstanding issues on the road of commercialization of extreme-ultraviolet lithography (EUVL). The application of Mo/Si multilayer optics in EUVL requires both sufficient radiation stability and also the highest possible normal-incidence reflectivity. A serious problem of conventional high-reflective Mo/Si multilayers capped by silicon is the considerable degradation of reflective properties
Modern Technologies in Space- and Ground-based Telescopes and Instrumentation II, 2012
ABSTRACT Optical coatings are an integral part of superior optical components. Astronomical appli... more ABSTRACT Optical coatings are an integral part of superior optical components. Astronomical applications (ground- and space-based) place especially high demands on these coatings, not only with regard to their optical performance but also to their mechanical and environmental stability, their thermal properties, and their radiation resistance. This article presents a short overview of several coating solutions developed in recent years at Fraunhofer IOF in order to meet the challenging demands of astronomical applications. The focus is placed on high reflective coatings for different wavelength regions including coatings for the VUV range below 100nm, coatings for the DUV wavelength range above 100nm and VIS/NIR/IR coatings. Further, amorphous silicon layers will be introduced which can be polished to very low roughness values and therefore can act as polishing layer for the manufacture of ultraprecise optical components from metal substrates.
Laser-Induced Damage in Optical Materials: 2004, 2005
The paper proposes to review briefly steps of classical experimental progress towards resistant V... more The paper proposes to review briefly steps of classical experimental progress towards resistant VUV-XUV coatings. It intends to address some of the new challenges of the VUV-XUV radiation resistant coatings, including material investigations, manufacturing, characterizations and active optical components.
Optical Interference Coatings, 2007
The demand to enhance the optical resolution and to structure ever smaller details, has pushed th... more The demand to enhance the optical resolution and to structure ever smaller details, has pushed the optics development in recent years. Mainly induced by the production of more powerful electronic circuits with the aid of projection lithography, an increasing interest is directed towards ...
Advanced Microlithography Technologies, 2005
Most applications of Mo/Si multilayer optics in Extreme ultraviolet lithography (EUVL) require a ... more Most applications of Mo/Si multilayer optics in Extreme ultraviolet lithography (EUVL) require a high normal incidence reflectivity. Using dc magnetron sputtering we achieved R = 68.8 % @ lambda = 13.45 nm. High-reflective Mo/Si/C and high-temperature stable Mo/C/Si/C multilayer mirrors with reflectivity of 69.6 % and 61.0 % at 13.5 nm were developed. Microstructure and optical properties of the multilayers
Emerging Lithographic Technologies XII, 2008
Advances in X-Ray/EUV Optics, Components, and Applications, 2006
The application of multilayer optics in EUV lithography requires not only the highest possible no... more The application of multilayer optics in EUV lithography requires not only the highest possible normal-incidence reflectivity but also a long-term thermal and radiation stability at operating temperatures. This requirement is most important in the case of the collector mirror of the illumination system close to the EUV source where a short-time decrease in reflectivity is most likely. Mo/Si multilayer mirrors,
Advances in X-Ray/EUV Optics and Components II, 2007
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, 2004
Emerging Lithographic Technologies VII, 2003