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Tina Schuster

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Papers by Tina Schuster

Research paper thumbnail of Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication

Novel Patterning Technologies 2023

Research paper thumbnail of Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist

Novel Patterning Technologies 2023

Research paper thumbnail of Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint

Journal of Vacuum Science & Technology B

Combining microstructures of different dimensions benefits from hybrid manufacturing strategies t... more Combining microstructures of different dimensions benefits from hybrid manufacturing strategies that use nanoimprint for generating regular large area structures and laser lithography for larger grayscale topography. While the individual processes are straightforward, due to the thermoplastic property of the positive resist used for grayscale lithography, diffraction on surface gratings and degradation of photoactive substances require a careful choice of the order of process steps, and balance of process, temperatures, and dimensions.

Research paper thumbnail of Zur Photolyse von 3,3′-Diazidodiphenylsulfon in Photoresistschichten

Zeitschrift für Chemie, 1987

Research paper thumbnail of mr-NIL 6000: new epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography

Emerging Lithographic Technologies XI, 2007

ABSTRACT

Research paper thumbnail of Pattern Transfer Process Using Innovative Polymers in Combined Thermal and UV Nanoimprint Lithography (TUV-NIL)

MRS Proceedings, 2007

ABSTRACTWe performed combined thermal and ultraviolet nanoimprint lithography (TUV-NIL) using a r... more ABSTRACTWe performed combined thermal and ultraviolet nanoimprint lithography (TUV-NIL) using a recently developed nanoimprint polymer (mr-NIL 6000 from Micro Resist technology GmbH) and achieved an imprinted feature size of 50 nm. We used commercially available 2-inch-diameter transparent quartz molds (NIL Technology, Denmark and Obducat, Sweden) comprising 150 nm to 190 nm-deep features of various shapes and aspect ratios with lateral dimensions ranging between 50 nm and 300 nm. The imprint polymer was spun onto a silicon substrate, covered with an oxide layer. After the TUV-NIL step, residual polymer layers at the bottom of the imprinted features were removed by oxygen plasma etching. Imprinted patterns were then transferred into the silicon oxide layer underneath by reactive ion etching (RIE). In a final step the residual polymer was stripped off the silicon oxide surface in an oxygen asher. All imprinted features as well as the corresponding pattern transfer results showed good...

Research paper thumbnail of Development of thermosets for thermal nanoimprint lithography at decreased temperatures

Prepolymers formed from multifunctional allyl monomers can beneficially used in nanoimprint litho... more Prepolymers formed from multifunctional allyl monomers can beneficially used in nanoimprint lithography (NIL), since they cure as a consequence of heating during the imprint process. Thus they have the potential to enable NIL at comparatively low temperatures while the imprinted patterns concurrently show high thermal stability, in contrast to thermoplastic polymers, where the thermal behaviour of the imprinted patterns is closely related to the glass transition temperature (Tg) of the polymers. The use of allyl prepolymers for NIL was previously described, but only very few experimental data are known. In recent investigations on the application of allyl prepolymers for NIL a displacement of the patterns on the wafer has been observed after cooling down the imprinted polymer in the press. This could be avoided by detaching the stamp at the imprint temperature, i.e. without cooling down the press, which requires the polymer to be crosslinked to a great extent in this stage. Since hi...

Research paper thumbnail of Wechselwirkungen zwischen Kl�rschlammpartikeln und Polyelektrolyten

Chemie Ingenieur Technik - CIT, 1996

Die durchgefuhrten Messungen und Modellrechnungen zeigen die grundsatzliche Durchfiihrbarkeit des... more Die durchgefuhrten Messungen und Modellrechnungen zeigen die grundsatzliche Durchfiihrbarkeit des Risermegenerator-Verfahrens. Die gewonnenen Ergebnisse unterstreichen in anschaulicher Weise die Wichtigkeit der Katalysatorenhvicklung in bezug auf Abriebfestigkeit und Sauerstoffaufnahmevermogen fur die Wirtschaftlichkeit des Verfahrens. Die Autoren danken der Firma Akzo Research Laboratories, Obernburg, fiir die finanzielle und technische Unterstiitzung und dem BMFT, das das Projekt unter dem Zeichen 03C251 gefordert hat.

Research paper thumbnail of mr-NIL 6000LT – Epoxy-based curing resist for combined thermal and UV nanoimprint lithography below 50°C

Microelectronic Engineering, 2009

The aim of the work presented here was to develop curing polymers for nanoimprint lithography (NI... more The aim of the work presented here was to develop curing polymers for nanoimprint lithography (NIL) enabling short cycle time, low imprint temperature, and an isothermal imprint process. The result is mr-NIL 6000LT: A photochemically curing polymer system for isothermal imprinting by combined thermal and UV nanoimprint lithography. It allows a lower imprint temperature than materials presented previously [C.

Research paper thumbnail of Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication

Novel Patterning Technologies 2023

Research paper thumbnail of Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist

Novel Patterning Technologies 2023

Research paper thumbnail of Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint

Journal of Vacuum Science & Technology B

Combining microstructures of different dimensions benefits from hybrid manufacturing strategies t... more Combining microstructures of different dimensions benefits from hybrid manufacturing strategies that use nanoimprint for generating regular large area structures and laser lithography for larger grayscale topography. While the individual processes are straightforward, due to the thermoplastic property of the positive resist used for grayscale lithography, diffraction on surface gratings and degradation of photoactive substances require a careful choice of the order of process steps, and balance of process, temperatures, and dimensions.

Research paper thumbnail of Zur Photolyse von 3,3′-Diazidodiphenylsulfon in Photoresistschichten

Zeitschrift für Chemie, 1987

Research paper thumbnail of mr-NIL 6000: new epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography

Emerging Lithographic Technologies XI, 2007

ABSTRACT

Research paper thumbnail of Pattern Transfer Process Using Innovative Polymers in Combined Thermal and UV Nanoimprint Lithography (TUV-NIL)

MRS Proceedings, 2007

ABSTRACTWe performed combined thermal and ultraviolet nanoimprint lithography (TUV-NIL) using a r... more ABSTRACTWe performed combined thermal and ultraviolet nanoimprint lithography (TUV-NIL) using a recently developed nanoimprint polymer (mr-NIL 6000 from Micro Resist technology GmbH) and achieved an imprinted feature size of 50 nm. We used commercially available 2-inch-diameter transparent quartz molds (NIL Technology, Denmark and Obducat, Sweden) comprising 150 nm to 190 nm-deep features of various shapes and aspect ratios with lateral dimensions ranging between 50 nm and 300 nm. The imprint polymer was spun onto a silicon substrate, covered with an oxide layer. After the TUV-NIL step, residual polymer layers at the bottom of the imprinted features were removed by oxygen plasma etching. Imprinted patterns were then transferred into the silicon oxide layer underneath by reactive ion etching (RIE). In a final step the residual polymer was stripped off the silicon oxide surface in an oxygen asher. All imprinted features as well as the corresponding pattern transfer results showed good...

Research paper thumbnail of Development of thermosets for thermal nanoimprint lithography at decreased temperatures

Prepolymers formed from multifunctional allyl monomers can beneficially used in nanoimprint litho... more Prepolymers formed from multifunctional allyl monomers can beneficially used in nanoimprint lithography (NIL), since they cure as a consequence of heating during the imprint process. Thus they have the potential to enable NIL at comparatively low temperatures while the imprinted patterns concurrently show high thermal stability, in contrast to thermoplastic polymers, where the thermal behaviour of the imprinted patterns is closely related to the glass transition temperature (Tg) of the polymers. The use of allyl prepolymers for NIL was previously described, but only very few experimental data are known. In recent investigations on the application of allyl prepolymers for NIL a displacement of the patterns on the wafer has been observed after cooling down the imprinted polymer in the press. This could be avoided by detaching the stamp at the imprint temperature, i.e. without cooling down the press, which requires the polymer to be crosslinked to a great extent in this stage. Since hi...

Research paper thumbnail of Wechselwirkungen zwischen Kl�rschlammpartikeln und Polyelektrolyten

Chemie Ingenieur Technik - CIT, 1996

Die durchgefuhrten Messungen und Modellrechnungen zeigen die grundsatzliche Durchfiihrbarkeit des... more Die durchgefuhrten Messungen und Modellrechnungen zeigen die grundsatzliche Durchfiihrbarkeit des Risermegenerator-Verfahrens. Die gewonnenen Ergebnisse unterstreichen in anschaulicher Weise die Wichtigkeit der Katalysatorenhvicklung in bezug auf Abriebfestigkeit und Sauerstoffaufnahmevermogen fur die Wirtschaftlichkeit des Verfahrens. Die Autoren danken der Firma Akzo Research Laboratories, Obernburg, fiir die finanzielle und technische Unterstiitzung und dem BMFT, das das Projekt unter dem Zeichen 03C251 gefordert hat.

Research paper thumbnail of mr-NIL 6000LT – Epoxy-based curing resist for combined thermal and UV nanoimprint lithography below 50°C

Microelectronic Engineering, 2009

The aim of the work presented here was to develop curing polymers for nanoimprint lithography (NI... more The aim of the work presented here was to develop curing polymers for nanoimprint lithography (NIL) enabling short cycle time, low imprint temperature, and an isothermal imprint process. The result is mr-NIL 6000LT: A photochemically curing polymer system for isothermal imprinting by combined thermal and UV nanoimprint lithography. It allows a lower imprint temperature than materials presented previously [C.

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