mr-NIL 6000LT – Epoxy-based curing resist for combined thermal and UV nanoimprint lithography below 50°C (original) (raw)

Transparent hybrid polymer stamp copies with sub-50-nm resolution for thermal and UV-nanoimprint lithography

Helmut Schift

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2009

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A comparison of thermally and photochemically cross-linked polymers for nanoimprinting

Ivan Maximov, L. Montelius

Microelectronic Engineering, 2003

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Solvent‐Vapor‐Assisted Imprint Lithography

Piers Andrew

Advanced …, 2007

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Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials

Marko Vogler, Michael M Muehlberger

24th European Mask and Lithography Conference, 2008

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Imprinted polymer stamps for UV-NIL

Tapio Mäkelä

Microelectronic Engineering, 2009

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Stamp replication for thermal and UV nanoimprint lithography using a UV-sensitive silsesquioxane resist

CHOUIKI Mustapha

Microelectronic Engineering, 2009

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High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps

Helmut Schift

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2016

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Non-sticky polyvinylsilazane stamp with high durability for UV-nanoimprint lithography

hyunha park

Microelectronic Engineering, 2012

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Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists

jumana boussey

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2007

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Using polydimethylsiloxane as a thermocurable resist for a soft imprint lithography process

F. Carcenac

Microelectronic Engineering, 2002

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Thermal analysis for step and flash imprint lithography during UV curing process

Grant Willson

Microelectronic Engineering, 2006

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New Organic Photo-Curable Nanoimprint Resist ≪mr-NIL210≫ for High Volume Fabrication Applying Soft PDMS-Based Stamps

Manuel Thesen

Journal of Photopolymer Science and Technology

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Development of imprint materials for the Step and Flash Imprint Lithography process

Grant Willson

SPIE Proceedings, 2004

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Thermal Imprinting of Nano-Patterns Using Thiol-Based Self-Assembled Monolayer-Treated Nickel Template

Kyeongjae Byeon

Journal of Nanoscience and Nanotechnology, 2009

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Characterization of Etch Resistance Property of Imprinting Resin

Seon-Yong Hwang

Electronic Materials Letters

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Thermal imprint lithography using sub-micron sized nickel template coated with thin SiO2 layer

Kyeongjae Byeon

Microelectronic Engineering, 2007

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High‐Resolution Nanoimprinting with a Robust and Reusable Polymer Mold

M. S. M. Saifullah

Advanced …, 2007

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Nanoimprint Lithography with UV-Curable Hyperbranched Polymer Nanocomposites

G. Voirin

Macromolecular Symposia, 2010

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Novel transparent hybrid polymer working stamp for UV-imprinting

Michael M Muehlberger

Microelectronic Engineering, 2009

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Development and validation of functional imprint material for the step and flash imprint lithography process

Paolo Coppo

Microelectronic Engineering, 2008

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Nanoimprint lithography using IR laser irradiation

Vitoldas Kopustinskas, Sigitas Tamulevicius

Applied Surface Science, 2006

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Direct nanoimprinting of metal oxides by in situ thermal co-polymerization of their methacrylates

M. S. M. Saifullah

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Industrial applications demanding low and high resolution features realized by soft UV-NIL and hot embossing

T. Glinsner

Alternative Lithographic Technologies, 2009

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Imprint lithography: lab curiosity or the real NGL

Kevin Nordquist

SPIE Proceedings, 2003

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Compact LED based nanoimprinter for UV-NIL

Nikolaj Gadegaard

Microelectronic Engineering, 2011

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Optimization of demolding temperature for throughput improvement of nanoimprint lithography

L. Davoust

Microelectronic Engineering, 2007

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17.2: Invited Paper: Design of laboratory and production machinery for thermal and UV Nanoimprint for R2R and R2P applications

Thomas Exlager

SID Symposium Digest of Technical Papers, 2019

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Fabrication of 70 nm-Sized Zero Residual Polymer Patterns by Thermal Nanoimprint Lithography

Kyeongjae Byeon

Journal of Nanoscience and Nanotechnology, 2009

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A Three‐Dimensional Ultraviolet Curable Nanoimprint Lithography (3D UV‐NIL)

Khairudin Mohamed, Maan Alkaisi

2009

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Nanoimprinting ultrasmall and high-aspect-ratio structures by using rubber-toughened UV cured epoxy resist Nanoimprinting ultrasmall and high-aspect-ratio structures by using rubber-toughened UV cured epoxy resist

Jay Guo

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