Optical properties of x-ray lithography masks (original) (raw)

Modeling of electron beam scattering in high resolution lithography for the fabrication of X-Ray masks

Saveria Santangelo

European Transactions on Telecommunications, 1990

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3D microstructures fabricated by partially opaque X-ray lithography masks

Stefano Cabrini

Microelectronic Engineering, 2000

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Fabrication of the X-Ray Mask using the Silicon Dry Etching

Hiroshi Tsujii

Journal of Advanced Mechanical Design Systems and Manufacturing, 2008

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X-ray lithography-an overview

juan maldonado

Proceedings of The IEEE, 1993

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Characterization of optics and masks for the EUV lithography

M. Putero

Microelectronic Engineering, 2002

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Mask technologies for soft-x-ray projection lithography at 13 nm

Alastair MacDowell

Applied Optics, 1993

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An overview of x-ray lithography for use in semiconductor device preparation

US TANDON

Vacuum, 1991

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Masks for X-Ray-Lithography with a Point-Source Stepper

George Celler

Journal of Vacuum Science & Technology B, 1992

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Wavelength Dependence of Exposure Window and Resist Profile in X-Ray-Lithography

Juan Gilberto Ceballos Maldonado

Journal of Vacuum Science & Technology B, 1994

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X-ray microanalysis of optical materials for 157nm photolithography

Goran Dražič

Crystal Engineering, 2002

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Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning

Patrick Naulleau

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2010

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Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes

Roxann Engelstad

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1996

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Fabrication of X-Ray Masks Using the Silicon Direct Write Electron-Beam Lithography Process and Complementary Electron-Sensitive Resists

Yousef Awad

Japanese Journal of Applied Physics, 2002

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Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

Andreas Erdmann

Advanced Optical Technologies

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Using computational methods for mask aligner lithography

Ulrich Hofmann

SPIE Newsroom, 2012

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Sub‐100‐nm x‐ray mask technology using focused‐ion‐beam lithography

Anthony Yen

1989

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Reflective masks for extreme ultraviolet lithography

Long Khanh

1994

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Low-cost and high-resolution x-ray lithography utilizing a lift-off sputtered lead film mask on a Mylar substrate

Rungrueang Phatthanakun

Journal of …, 2010

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Influence of MEEF change on the mask shadowing effect in extreme ultraviolet lithography

Chang Jeong

Microelectronic Engineering, 2010

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Article Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography

Harutaka Mekaru

2016

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Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography

Harutaka Mekaru

Micromachines, 2015

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X-ray absorption spectroscopy to probe interfacial issues in photolithography

Sarah Sambasivan

Proceedings of SPIE, 2003

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Principles of lithography

Yu Dai

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X-ray reflectivity of silicon on insulator wafers

Joel Eymery

Materials Science in Semiconductor Processing, 2001

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Polymer-based X-ray masks patterned by direct laser writing

Swathi Iyer Iyer

Review of Scientific Instruments, 2018

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Control of optical and mechanical properties of polycrystalline silicon membranes for x-ray masks

George Celler

Proceedings of SPIE, 1990

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Microscopy of extreme ultraviolet lithography masks with 132 nm tabletop laser illumination

P. Wachulak

Optics Letters, 2009

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Investigation of polarization effects on new mask materials

Karsten Bubke

Optical Microlithography XVIII, 2005

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