X-ray lithography-an overview (original) (raw)

An overview of x-ray lithography for use in semiconductor device preparation

US TANDON

Vacuum, 1991

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X-ray lithography for VLSI

Richard Hollman

Microelectronics Reliability, 1984

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Physical and technological limits in optical and x-ray lithography

Wolfgang Arden

Microelectronic Engineering, 1987

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Nanometer x-ray lithography

Frank Hartley

Design, Characterization, and Packaging for MEMS and Microelectronics, 1999

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Sub‐100‐nm x‐ray mask technology using focused‐ion‐beam lithography

Anthony Yen

1989

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Masks for X-Ray-Lithography with a Point-Source Stepper

George Celler

Journal of Vacuum Science & Technology B, 1992

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3D microstructures fabricated by partially opaque X-ray lithography masks

Stefano Cabrini

Microelectronic Engineering, 2000

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Patterning of 100 nm Features Using X-ray Lithography

Raman Viswanathan

Journal of Photopolymer Science and Technology, 1997

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Synchrotron-based X-ray lithography at Stanford University

Daniel Seligson

Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1988

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Extension of x-ray lithography to 50 nm with a harder spectrum

JUAN PABLO JOSE MARIA MALDONADO

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999

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Low-cost and high-resolution x-ray lithography utilizing a lift-off sputtered lead film mask on a Mylar substrate

Rungrueang Phatthanakun

Journal of …, 2010

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3-Dimensional Microstructure Fabrication using Multiple Moving Mask Deep X-ray Lithography Process

Osamu Tabata

IEEJ Transactions on Sensors and Micromachines, 2000

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Optical properties of x-ray lithography masks

J. Cuomo

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1990

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Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography

Mumit Khan

Microelectronic Engineering, 1998

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X-Ray Lithography for Nanofabrication: Is There a Future?

Alessio Turchet

Frontiers in nanotechnology, 2022

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Concept, construction and commissioning of an alignment system for deep X-ray lithography

Alexei Bogdanov

Microelectronic Engineering, 2002

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Wavelength Dependence of Exposure Window and Resist Profile in X-Ray-Lithography

Juan Gilberto Ceballos Maldonado

Journal of Vacuum Science & Technology B, 1994

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Quality control for deep x-ray lithography (LIGA): a preliminary metrology study

Richard Leach

Microsystem Technologies, 2012

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Operational simulation of an x-ray lithography cell

Walt Trybula

Proceedings of the 31st conference on Winter simulation Simulation---a bridge to the future - WSC '99, 1999

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Validation of X-ray lithography and development simulation system for moving mask deep X-ray lithography

Jan G Korvink, Yoshikazu HIRAI, Osamu Tabata

… Systems, Journal of, 2006

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Mask technologies for soft-x-ray projection lithography at 13 nm

Alastair MacDowell

Applied Optics, 1993

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Fabrication of X-Ray Masks Using the Silicon Direct Write Electron-Beam Lithography Process and Complementary Electron-Sensitive Resists

Yousef Awad

Japanese Journal of Applied Physics, 2002

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X-ray lathe: An X-ray lithographic exposure tool for nonplanar objects

Alan Feinerman

Journal of microelectromechanical systems, 1996

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High resolution x-ray masks for high aspect ratio microelectromechanical systems (HARMS)

Flavio Aristone

Micromachining and Microfabrication Process Technology VIII, 2003

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Fabrication of the X-Ray Mask using the Silicon Dry Etching

Hiroshi Tsujii

Journal of Advanced Mechanical Design Systems and Manufacturing, 2008

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Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures

Jost Goettert

TechConnect Briefs, 2012

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Monte Carlo simulation of line edge profiles and linewidth control in x-ray lithography

Armand Neukermans

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1985

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Electrodeposition Assisted X-ray Lithography: Single Step Approach

Carlo Segre

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Process Simulation of Moving Mask Deep X-Ray Lithography

Jan G Korvink

Mem SR Cent …, 2005

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Use of SU-8 photoresist for very high aspect ratio x-ray lithography

Alexei Bogdanov

Microelectronic Engineering, 2000

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Enhanced adhesion buffer layer for deep x-ray lithography using hard x rays

Derrick C Mancini

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

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Lithographic Materials Technologies: 193 nm Imaging and Beyond

Mark Neisser

MRS Proceedings, 1999

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Wafer scale manufacturing of high precision micro-optical components through X-ray lithography yielding 1800 Gray Levels in a fingertip sized chip

Herbert Moser

Scientific Reports

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Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes

Roxann Engelstad

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1996

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