Hypersonic plasma particle deposition of nanostructured silicon and silicon carbide (original) (raw)
Experimental study of nanostructured silicon carbide film formation by hypersonic plasma particle deposition
Peter McMurry
Journal of Aerosol Science, 1998
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Nanostructured materials production by hypersonic plasma particle deposition
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Nanostructured Materials, 1997
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Hypersonic plasma particle deposition of Si–Ti–N nanostructured coatings
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Surface & Coatings Technology, 2004
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Effect of process parameters on the structure of Si–Ti–N nanostructured coatings deposited by hypersonic plasma particle deposition
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Surface & Coatings Technology, 2005
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Ultrafine particles produced by plasma enhanced chemical vapor. Deposition from SiH4, CH4 , NH3 and B2H6 gas mixtures - for nanostructured ceramics applications
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Thin Solid Films, 2006
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Characterization of Nanoparticle Films and Structures Produced by Hypersonic Plasma Particle Deposition
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Characterisation of silicon carbide films deposited by plasma-enhanced chemical vapour deposition
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Thin Solid Films, 2008
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Synthesis of nanophase silicon, carbon, and silicon carbide powders using a plasma expansion process
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Journal of Materials Research, 1995
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Akiko Kobayashi
Materials Science and Engineering B Advanced Functional Solid State Materials, 2007
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Argon Assisted Plasma Chemical Vapour Deposition of Amorphous Silicon Carbide Films
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Japanese Journal of Applied Physics, 1997
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Ji-Youn Seo
Thin Solid Films, 2002
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Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics aplications
Gregorio Viera Mármol
1999
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Effects of Plasma-Sprayed Ceramic Coatings on the Strength Distribution of Silicon Carbide Materials
John Mecholsky
Journal of the American Ceramic Society, 1990
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Self-organization and dynamics of nanoparticles in chemically active plasmas for low-temperature deposition of silicon and carbon-based nanostructured films
Kostya Ostrikov
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Nanostructured SiC by chemical vapor deposition and nanoparticle impaction
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Evaluation of the mechanical behaviour of nanometre-thick coatings deposited using an atmospheric pressure plasma system
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Low temperature deposition of nanocrystalline silicon carbide films by plasma enhanced chemical vapor deposition and their structural and optical characterization
Shubhra Gangopadhyay
Journal of Applied Physics, 2003
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Microwave-plasma synthesis of nano-sized silicon carbide at atmospheric pressure.
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SiC film growth on Si (111) by supersonic beams of C 60
R. Verucchi, Salvatore Iannotta, L. Aversa
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The effects of He plasma interactions with SiH4 in remote plasma enhanced chemical vapor deposition
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Microstructure, Adhesion and Wear of Plasma Sprayed AlSi-SiC Composite Coatings
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SiC/Si-dots multilayer structures formed by supersonic free jets of CH[sub 3]SiH[sub 3] and Si[sub 3]H[sub 8]
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Plasma Enabled Fabrication of Silicon Carbide Nanostructures
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Springer Series in Materials Science, 2013
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Nanocrystallites formation in aSiC by low power plasma enhanced chemical vapour deposition
Ayana Bhaduri
Physica Status Solidi (c), 2010
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The impact of process variables on the chemical vapour deposition of silicon carbide
Robert Cromarty
2013
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Aerosol emission monitoring in the production of silicon carbide nanoparticles by induction plasma synthesis
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Plasma deposition of high temperature protective coatings
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Surface analysis of nanostructured ceramic coatings containing silicon carbide nanoparticles produced by plasma modulation chemical vapour deposition
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Nanoparticle formation using a plasma expansion process
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Plasma Chemistry and Plasma Processing, 1995
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Nano-Coating Process for Si [1 0 0] Wafer Using Atmospheric Pressure Plasma Jet (APPJ
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