Ciprian Iliescu | University Politehnica of Bucharest (original) (raw)
Papers by Ciprian Iliescu
HAL (Le Centre pour la Communication Scientifique Directe), Apr 1, 2008
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ACS Biomaterials Science & Engineering, 2016
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Nuclear Instruments and Methods, 1963
For the magnetic guiding field of the weak-, strong-, and FFAG-focusing ; nuclear instruments use... more For the magnetic guiding field of the weak-, strong-, and FFAG-focusing ; nuclear instruments used in the acceleration or dispersion of charged particles, ; general analytic expressions, valid for any point of the magnet gap, are derived ; concerning the following parameters: magnetic scalar potential, magnetic ; induction, and magnetic vector potential. These expressions are useful for the ; study of particle motion as well as for pole face design. (auth);
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Microorganisms, 2020
Coronaviruses are large, enveloped viruses with a single-stranded RNA genome, infecting both huma... more Coronaviruses are large, enveloped viruses with a single-stranded RNA genome, infecting both humans and a wide range of wild and domestic animals. SARS-CoV-2, the agent of the COVID-19 pandemic, has 80% sequence homology with SARS-CoV-1 and 96–98% homology with coronaviruses isolated from bats. The spread of infection is favored by prolonged exposure to high densities of aerosols indoors. Current studies have shown that SARS-CoV-2 is much more stable than other coronaviruses and viral respiratory pathogens. The severe forms of infection are associated with several risk factors, including advanced age, metabolic syndrome, diabetes, obesity, chronic inflammatory or autoimmune disease, and other preexisting infectious diseases, all having in common the pre-existence of a pro-inflammatory condition. Consequently, it is essential to understand the relationship between the inflammatory process and the specific immune response in SARS-CoV-2 infection. In this review, we present a general c...
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Sensors and Actuators B-chemical, 2020
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Microorganisms, Dec 13, 2021
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Micromachines, Apr 27, 2022
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International Journal of Software Engineering and Knowledge Engineering, Apr 1, 2005
This paper presents a novel dielectrophoresis (DEP) device where the DEP electrodes define the ch... more This paper presents a novel dielectrophoresis (DEP) device where the DEP electrodes define the channel walls. This is achieved by fabricating microfluidic channel walls from highly doped silicon so that they can also function as DEP electrodes. Compared with planar electrodes, this device increases the exhibited dielectrophoretic force on the particle, therefore decreases the applied potential and reduces the heating of the solution. A DEP device with triangle electrodes has been designed and fabricated. Compared with the other two configurations, semi-circular and square, triangle electrode presents an increased force, which can decrease the applied voltage and reduce the Joule effect. Yeast cells have been used to for testing the performance of the device.
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Biomicrofluidics, May 1, 2020
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Thin Solid Films, Jun 1, 2008
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Journal of Micromechanics and Microengineering, Dec 11, 2007
ABSTRACT This paper presents a solution for the deposition of thick amorphous silicon (alpha-Si:H... more ABSTRACT This paper presents a solution for the deposition of thick amorphous silicon (alpha-Si:H) in PECVD reactors for MEMS applications, such as sacrificial layer or mask layer for dry or wet etching of glass. This achievement was possible by tuning the deposition parameters to a 'zero' value of the residual stress in the a-Si: H layer. The influence of the process parameters, such as power, frequency mode, temperature, pressure and SiH(4)/Ar flow rates for tuning the residual stress and for a good deposition rate is analyzed. The deposition of low-stress and thick (more than 12 mu m in our case) alpha-Si:H layers was possible without generation of hillock defects (previously reported in literature for layers thicker then 2 mu m). Finally, the paper presents some MEMS applications of such a deposited alpha-Si: H layer: masking layer for deep wet etching as well as dry etching of glass, and sacrificial layer for dry or wet release.
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Micromachines, Jan 20, 2018
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Sensors and Actuators B-chemical, Apr 10, 2007
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Microsystem Technologies-micro-and Nanosystems-information Storage and Processing Systems, Mar 7, 2006
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Journal of Micromechanics and Microengineering, Dec 17, 2004
This paper describes a device in which the DEP electrodes form the channel walls. This is achieve... more This paper describes a device in which the DEP electrodes form the channel walls. This is achieved by fabricating microfluidic channel walls from highly doped silicon so that they can also function as DEP electrodes. The device is fully enclosed and there is no fluidic ...
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International Journal of Molecular Sciences, Dec 18, 2009
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CAS ... proceedings, Oct 1, 2007
The paper presents original contributions at manipulation of biological samples using electric fi... more The paper presents original contributions at manipulation of biological samples using electric field (dielectrophoresis). Design considerations, fabrication processes and experimental results of three original three dimensional (3D) dielectrophoretic (DEP) structures: DEP chip with 3D silicon electrodes, DEP chip with 3D electric field gradient and 3D filtering chip are analyzed. The paper presents also the experimental results of trapping yeast cells.
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Proceedings of SPIE, Dec 28, 2005
This paper presents a new fabrication process for nanotips array using notching effect of reflect... more This paper presents a new fabrication process for nanotips array using notching effect of reflected charges on mask (NERCOM). The NERCOM fabrication process is based on two phenomena: flowing of thick photoresist mask after bake and the notching effect of the reflected charges from the photoresist mask in a plasma etching process. Heating the photoresist at different temperature and time will generate different profile of the masking layer walls. During the plasma etching process, the charges (ions and radicals) are reflected by the oblique profile of the masking layer walls and generate an undercut. This phenomenon is utilized with an isotropic etching process in a Deep RIE system to produce tips. Due to the isotropy of the process, the tips are generated. The results indicate that the radii of the tips are in the range of 40 to 60 nm.
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HAL (Le Centre pour la Communication Scientifique Directe), Apr 1, 2008
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ACS Biomaterials Science & Engineering, 2016
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Nuclear Instruments and Methods, 1963
For the magnetic guiding field of the weak-, strong-, and FFAG-focusing ; nuclear instruments use... more For the magnetic guiding field of the weak-, strong-, and FFAG-focusing ; nuclear instruments used in the acceleration or dispersion of charged particles, ; general analytic expressions, valid for any point of the magnet gap, are derived ; concerning the following parameters: magnetic scalar potential, magnetic ; induction, and magnetic vector potential. These expressions are useful for the ; study of particle motion as well as for pole face design. (auth);
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Microorganisms, 2020
Coronaviruses are large, enveloped viruses with a single-stranded RNA genome, infecting both huma... more Coronaviruses are large, enveloped viruses with a single-stranded RNA genome, infecting both humans and a wide range of wild and domestic animals. SARS-CoV-2, the agent of the COVID-19 pandemic, has 80% sequence homology with SARS-CoV-1 and 96–98% homology with coronaviruses isolated from bats. The spread of infection is favored by prolonged exposure to high densities of aerosols indoors. Current studies have shown that SARS-CoV-2 is much more stable than other coronaviruses and viral respiratory pathogens. The severe forms of infection are associated with several risk factors, including advanced age, metabolic syndrome, diabetes, obesity, chronic inflammatory or autoimmune disease, and other preexisting infectious diseases, all having in common the pre-existence of a pro-inflammatory condition. Consequently, it is essential to understand the relationship between the inflammatory process and the specific immune response in SARS-CoV-2 infection. In this review, we present a general c...
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Sensors and Actuators B-chemical, 2020
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Microorganisms, Dec 13, 2021
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Micromachines, Apr 27, 2022
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International Journal of Software Engineering and Knowledge Engineering, Apr 1, 2005
This paper presents a novel dielectrophoresis (DEP) device where the DEP electrodes define the ch... more This paper presents a novel dielectrophoresis (DEP) device where the DEP electrodes define the channel walls. This is achieved by fabricating microfluidic channel walls from highly doped silicon so that they can also function as DEP electrodes. Compared with planar electrodes, this device increases the exhibited dielectrophoretic force on the particle, therefore decreases the applied potential and reduces the heating of the solution. A DEP device with triangle electrodes has been designed and fabricated. Compared with the other two configurations, semi-circular and square, triangle electrode presents an increased force, which can decrease the applied voltage and reduce the Joule effect. Yeast cells have been used to for testing the performance of the device.
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Biomicrofluidics, May 1, 2020
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Thin Solid Films, Jun 1, 2008
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Journal of Micromechanics and Microengineering, Dec 11, 2007
ABSTRACT This paper presents a solution for the deposition of thick amorphous silicon (alpha-Si:H... more ABSTRACT This paper presents a solution for the deposition of thick amorphous silicon (alpha-Si:H) in PECVD reactors for MEMS applications, such as sacrificial layer or mask layer for dry or wet etching of glass. This achievement was possible by tuning the deposition parameters to a 'zero' value of the residual stress in the a-Si: H layer. The influence of the process parameters, such as power, frequency mode, temperature, pressure and SiH(4)/Ar flow rates for tuning the residual stress and for a good deposition rate is analyzed. The deposition of low-stress and thick (more than 12 mu m in our case) alpha-Si:H layers was possible without generation of hillock defects (previously reported in literature for layers thicker then 2 mu m). Finally, the paper presents some MEMS applications of such a deposited alpha-Si: H layer: masking layer for deep wet etching as well as dry etching of glass, and sacrificial layer for dry or wet release.
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Micromachines, Jan 20, 2018
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Sensors and Actuators B-chemical, Apr 10, 2007
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Microsystem Technologies-micro-and Nanosystems-information Storage and Processing Systems, Mar 7, 2006
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Journal of Micromechanics and Microengineering, Dec 17, 2004
This paper describes a device in which the DEP electrodes form the channel walls. This is achieve... more This paper describes a device in which the DEP electrodes form the channel walls. This is achieved by fabricating microfluidic channel walls from highly doped silicon so that they can also function as DEP electrodes. The device is fully enclosed and there is no fluidic ...
Bookmarks Related papers MentionsView impact
International Journal of Molecular Sciences, Dec 18, 2009
Bookmarks Related papers MentionsView impact
CAS ... proceedings, Oct 1, 2007
The paper presents original contributions at manipulation of biological samples using electric fi... more The paper presents original contributions at manipulation of biological samples using electric field (dielectrophoresis). Design considerations, fabrication processes and experimental results of three original three dimensional (3D) dielectrophoretic (DEP) structures: DEP chip with 3D silicon electrodes, DEP chip with 3D electric field gradient and 3D filtering chip are analyzed. The paper presents also the experimental results of trapping yeast cells.
Bookmarks Related papers MentionsView impact
Proceedings of SPIE, Dec 28, 2005
This paper presents a new fabrication process for nanotips array using notching effect of reflect... more This paper presents a new fabrication process for nanotips array using notching effect of reflected charges on mask (NERCOM). The NERCOM fabrication process is based on two phenomena: flowing of thick photoresist mask after bake and the notching effect of the reflected charges from the photoresist mask in a plasma etching process. Heating the photoresist at different temperature and time will generate different profile of the masking layer walls. During the plasma etching process, the charges (ions and radicals) are reflected by the oblique profile of the masking layer walls and generate an undercut. This phenomenon is utilized with an isotropic etching process in a Deep RIE system to produce tips. Due to the isotropy of the process, the tips are generated. The results indicate that the radii of the tips are in the range of 40 to 60 nm.
Bookmarks Related papers MentionsView impact