Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing (original) (raw)

MRS Proceedings, 1999

View PDFchevron_right

Characteristics of high quality hafnium oxide gate dielectric

Chi-Wah Kok

Proceedings 2002 IEEE Hong Kong Electron Devices Meeting (Cat. No.02TH8616), 2002

View PDFchevron_right

The Electrical and Material Characterization of Hafnium Oxynitride Gate Dielectrics With TaN-Gate Electrode

Se jong Rhee

IEEE Transactions on Electron Devices, 2004

View PDFchevron_right

SiO 2 Free HfO 2 Gate Dielectrics by Physical Vapor Deposition

Takaaki Tsunoda, Hemanth Jagannathan

View PDFchevron_right

Growth and characterization of Hf–aluminate high-k gate dielectric ultrathin films with equivalent oxide thickness less than 10 Å

Helen Y L Chan

Journal of Applied Physics, 2003

View PDFchevron_right

Materials and Physical Properties of Novel High-k and Medium-k Gate Dielectrics

B Nguyen

MRS Proceedings, 2001

View PDFchevron_right

Hf-Based High-κ Dielectrics: A Review

Seda Kol

Acta Physica Polonica A, 2019

View PDFchevron_right

N and P metal oxide semiconductor field effect transistor characteristics of hafnium-doped SiO2 gate dielectrics

Veena Misra

Journal of Electronic Materials, 2001

View PDFchevron_right

Dielectric property and thermal stability of HfO2 on silicon

Jane Chang

Applied Physics Letters, 2002

View PDFchevron_right

An interfacial investigation of high-dielectric constant material hafnium oxide on Si substrate

pt liu

Thin Solid Films, 2005

View PDFchevron_right

Interfacial oxide determination and chemical/electrical structures of HfO2/SiOx/Si gate dielectrics

Marvin White

Solid-State Electronics, 2004

View PDFchevron_right

Impacts of Zr Composition in hboxHf1−xhboxZrxhboxOy\hbox{Hf}_{1-x} \hbox{Zr}_{x}\hbox{O}_{y}hboxHf1−xhboxZrxhboxOy Gate Dielectrics on Their Crystallization Behavior and Bias-Temperature-Instability Characteristics

SangHo Rha

IEEE Transactions on Electron Devices, 2011

View PDFchevron_right

HfO2 gate dielectric with 0.5 nm equivalent oxide thickness

Shubhra Gangopadhyay

Applied Physics Letters, 2002

View PDFchevron_right

Dielectric properties of Er−doped HfO[sub 2] (Er∼15%) grown by atomic layer deposition for high-κ gate stacks

C. Wiemer, M. Fanciulli, Sylvie Schamm-chardon

Applied Physics Letters, 2010

View PDFchevron_right

Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices

Vikram Singh

Journal of Materials Science-materials in Electronics, 2007

View PDFchevron_right

Physical model of BTI, TDDB and SILC in HfO2-based high-k gate dielectrics

Seiichi Miyazaki, Koichi Yamada

International Electron Devices Meeting, 2004

View PDFchevron_right

Hafnium oxide gate dielectrics grown from an alkoxide precursor: structure and defects

Yves Chabal

Materials Science and Engineering: B, 2004

View PDFchevron_right

Alternative high-k dielectrics for semiconductor applications

Mihaela Popovici

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2009

View PDFchevron_right

The use of nanolaminates to obtain structurally stable high-K films with superior electrical properties: HfNO–HfTiO

Wayne Kaplan

Journal of Applied Physics, 2008

View PDFchevron_right

An investigation into ultra-thin pseudobinary oxide (TiO2)x(Al2O3)1-x films as high-k gate dielectrics

Yidong Xia

Applied Physics A, 2007

View PDFchevron_right

Electrical properties of thin zirconium and hafnium oxide high-k gate dielectrics grown by atomic layer deposition from cyclopentadienyl and ozone precursors

Salvador Dueñas

Journal of Vacuum Science & Technology B, 2009

View PDFchevron_right

Effect of the post-deposition annealing on electrical characteristics of MIS structures with HfO2/SiO2 gate dielectric stacks

Gourab Dutta

Materials Science and Engineering: B, 2012

View PDFchevron_right

Si1−xGex metal-oxide-semiconductor capacitors with HfTaOx gate dielectrics

Mrinal Hota

Thin Solid Films, 2011

View PDFchevron_right

Hf–O–N and HfO2 barrier layers for Hf–Ti–O gate dielectric thin films

Valentin Craciun

Microelectronic Engineering, 2008

View PDFchevron_right

Electrical Properties of High-k ALD HfO2 Deposited on Strained Si Layers Epitaxially Grown on Si0.8Ge0.2/Si Substrates

Helmut Baumgart

ECS Transactions, 2008

View PDFchevron_right

Evidence of hafnia oxygen vacancy defects in MOCVD grown Hf x Si 1− x O y ultrathin gate dielectrics gated with Ru electrode

Milan Tapajna

Microelectronic Engineering, 2007

View PDFchevron_right

Optimization of annealing temperature for high-κ-based gate oxides using differential scanning calorimetry

Anil Sinha

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

View PDFchevron_right

Irradiation effect on dielectric properties of hafnium and gadolinium oxide gate dielectrics

H. García

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2009

View PDFchevron_right

Detrimental Hf penetration into TiN gate electrode and subsequent degradation in dielectric properties of HfSiO high-k film

Takuji Hosoi

Applied Physics Letters, 2011

View PDFchevron_right

Characteristics of atomic-layer-deposited thin Hf[sub x]Zr[sub 1−x]O[sub 2] gate dielectrics

Raghaw Rai

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2007

View PDFchevron_right

Electrical Properties of HfO 2 /Al 2 O 3 Dielectrics Fabricated on In 0.53 Ga 0.47 As by Using Atomic Layer Deposition at Low Temperatures (100 -200 @BULLET C

Md. Mamunur Rahman

View PDFchevron_right

Material and electrical analysis of hafnium titania bilayer dielectric metal-oxide-semiconductor field-effect transistors

Se jong Rhee

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2005

View PDFchevron_right

Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing (original) (raw)

Related papers