Masked ion beam lithography for proximity printing (original) (raw)

Silicon stencil masks for masked ion beam lithography proximity printing

Ivo W. Rangelow

Microelectronic Engineering, 1996

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Application of stencil masks for ion beam lithographic patterning

Silvia Schintke

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2013

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Ion projection lithography: status of tool and mask developments

Rainer Kaesmaier

Microelectronic Engineering, 2001

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A high resolution beam scanning system for deep ion beam lithography

S. Springham

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1998

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Sub‐100‐nm x‐ray mask technology using focused‐ion‐beam lithography

Anthony Yen

1989

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Mechanical modeling of ion beam lithography masks

Roxann Engelstad

Microelectronic Engineering, 1998

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Masks for X-Ray-Lithography with a Point-Source Stepper

George Celler

Journal of Vacuum Science & Technology B, 1992

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Micromachining using deep ion beam lithography

Jose Sanchez

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1997

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Nanometer x-ray lithography

Frank Hartley

Design, Characterization, and Packaging for MEMS and Microelectronics, 1999

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Novel electrostatic column for ion projection lithography

A. Mondelli

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994

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Multispecies focused ion beam lithography system and its applications

Achim Nadzeyka, P. Mazarov

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2013

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3D microstructures fabricated by partially opaque X-ray lithography masks

Stefano Cabrini

Microelectronic Engineering, 2000

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DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing

Ivo Rangelow

Microelectronic Engineering, 1998

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Ion beam lithograpy using a nano-aperture

Rick D Franich, Sergey Rubanov

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2007

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Shadow electron beam 1:1 scale printing with 0.1 ωm size elements

Leonid Velikov

Vacuum, 1991

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Development of an MeV ion beam lithography system in Jyv�skyl�

Harry Whitlow

Nucl Instrum Meth Phys Res B, 2007

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Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment

Ivo Rangelow

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Nano-proximity direct ion beam writing

Simona Domazetovska

Nanofabrication, 2016

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Ion Projection Lithography: Progress of European MEDEA & International Program

Rainer Kaesmaier

Microelectronic Engineering, 2000

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Neon Ion Beam Lithography (NIBL)

Jeff Marshman, D. Ferranti, Donald Winston

Nano Letters, 2011

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Nanoimprint Mold Manufacturing with Focused Ion Beam

Max Chung

2007

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A Versatile Approach for Biomaterial Patterning: Masked Ion Beam Lithography

nikola batina

MRS Proceedings, 2001

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Simulation of latent image formation for ion beam projection lithography

Panagiotis Argitis

Microelectronic Engineering, 2001

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High resolution x-ray masks for high aspect ratio microelectromechanical systems (HARMS)

Flavio Aristone

Micromachining and Microfabrication Process Technology VIII, 2003

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Development of an MeV ion beam lithography system in Jyväskylä

Sergey Gorelick

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2007

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Electron beam lithography: resolution limits and applications

F. Carcenac

Applied Surface Science, 2000

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Independent-Exposure Method in Electron-Beam Lithography

Sunkyu Lee

Lithography, 2010

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High-resolution lithography with a vacuum STM

Christie Marrian

Ultramicroscopy, 1992

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Fast prototyping of high-aspect ratio, high-resolution X-ray masks by gas-assisted focused ion beam

Frank Hartley

Microsystem Technologies, 2003

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Proton beam writing: a tool for high-aspect ratio mask production

Kambiz Ansari

Microsystem Technologies, 2007

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Multiple electron-beam lithography

Marian Mankos

Microelectronic Engineering, 2001

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