Marks for SCALPEL® tool optics optimization (original) (raw)

Distributed axis electron-beam system for lithography and inspection—preliminary experimental results

Luis Cruz-Rivera

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2002

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CMOS compatible alignment marks for the SCALPEL proof of lithography tool

m bLAKEY

Microelectronic Engineering, 1999

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Large area electron scattering effects on SCALPEL mask critical dimension control

Kevin Nordquist

Microelectronic Engineering, 2001

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Optimization of a SCALPEL® exposure tool using a diffractive image quality technique

m bLAKEY

Microelectronic Engineering, 1999

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Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL)

Thomas Saunders

Microelectronic Engineering - MICROELECTRON ENG, 1998

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Probe shape measurement in an electron beam lithography system

Patrick Naulleau

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004

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An electron beam lithography and digital image acquisition system for scanning electron microscopes

Stoyan Russev

Journal of Microscopy, 2007

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Improvements of Secondary Electron Imaging and Endpoint Detection in Focused Ion Beam Circuit Modification

Ray Valery

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Fabrication of 20 nm patterns for automatic measurement of electron beam size using BEAMETR technique

Stefano Cabrini

Microelectronic Engineering, 2009

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PREVAIL—Electron projection technology approach for next-generation lithography

Hans Peter Pfeiffer

IBM Journal of Research and Development, 2001

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50 years of electron beam lithography: Contributions from Jena (Germany)

Peter Hahmann

Microelectronic Engineering, 2009

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Estimation of wave fields of incident beams in a transmission electron microscope by using a small selected-area aperture

Jun Yamasaki

Journal of Electron Microscopy, 2011

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Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography

Jia-Yush Yen

Lithography Asia 2009, 2009

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Absolute two-dimensional sub-micron metrology for electron beam lithography

Michael Raugh

Precision Engineering, 1985

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Electron Microscopic Measurement of the Size of the Optical Focus in Laser Scanning Microscopy

W. Amos

Microscopy and Microanalysis, 2012

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Thermal distortion predictions of a silicon wafer during exposure in a SCALPEL tool

Gregg M Gallatin

Microelectronic Engineering, 2000

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Material interface detection based on secondary electron images for focused ion beam machining

Fajar Julian

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Mask blank fabrication, pattern transfer, and mounting distortion simulations for the 8-in. format SCALPEL mask

Roxann Engelstad

Microelectronic Engineering, 2001

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Automatic measurement of electron beam size by beam metrology technique using 20 nm test pattern

Scott Dhuey, Stefano Cabrini

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2009

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Low-energy scanning electron microscope using a monochromator with double-offset cylindrical lenses

Boklae Cho

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2015

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Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system

Jia-Yush Yen

Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2011

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Performance of Plastic Electron Optics Components Fabricated Using a 3D Printer

Peter Beierle

Ultramicroscopy

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Construction of a new type of low-energy, scanning electron microscope with atomic resolution

Krister Svensson

2009

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Progress on scanning field emission microscope development for surface observation

Sami Tantawi

Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2011

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Pattern placement correction methodology for 200 mm SCALPEL masks

Raymond Jeffer

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2001

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Pinhole Camera For Hot Environment Viewing Of Electron Beam Materials Processing

michael Rushford

SPIE Vol 787 Optical Techniques for Sensing and Measurement in Hostile Environments (1987), 1987

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Simulating the response of electron-beam projection lithography masks under standardized mounting techniques

Roxann Engelstad

J. Vac. Sci. Technol. B, 2001

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Image sharpness measurement in scanning electron microscopy-part I

Michael Postek

Scanning, 2006

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Precision assembly of a miniaturized wire deflector for electron-beam lithography

Thomas Elster

Microelectronic Engineering, 2012

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A quick estimation of the LEED pattern size formed by an electrostatic objective lens in LEEM

Raymond Phaneuf

Optik - International Journal for Light and Electron Optics, 2001

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Recent Development-1 of CADTEL Software: The Resolution and Focusing Parameters Affecting at the Properties of Electron Magnetic Lenses

Hussain Hasan

Iraqi Journal of Science, 2022

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X-Ray Knife as a Submicrometer Tool for Studying Focusing Lens Quality

Nikolay Artemiev

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Design and beam dynamics of a Transmission Electron Microscope electron gun assembly

Dr. Ghalib ul Islam /AP/Pysics/TTS/VEH

Vacuum, 2019

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Probe technologies for micro/nano measurements

Kuang-Chao Fan

2007 7th IEEE Conference on Nanotechnology (IEEE NANO), 2007

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Analysis of film response to electron beams using a laser scanner system developed in the laboratory

sivamany kandaiya

Applied Radiation and Isotopes, 2005

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