Front-to-back alignment techniques in microelectronics/MEMS fabrication: a review (original) (raw)

Precision passive mechanical alignment of wafers

Neelabh Tiwari

IEEE/ASME Journal of Microelectromechanical Systems, 2003

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Effect of alignment mark depth on alignment signal behavior in advanced lithography

Kader Ibrahim

2008

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Layer-to-layer alignment for step and flash imprint lithography

Grant Willson

SPIE Proceedings, 2001

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NIL - a low-cost and high-throughput MEMS fabrication method compatible with IC manufacturing technology

Kemiao Jia

Microelectronics Journal, 2006

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Photolithography on bulk micromachined substrates

J.W. Spronck

Journal of Micromechanics and Microengineering, 2009

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New Alignment Sensors for Optical Lithography

Kazuya OTA

Japanese Journal of Applied Physics, 1990

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Precision Hand Assembly of MEMS Subsystems Using DRIE-Patterned Deflection Spring Structures: An Example of an Out-of-Plane Substrate Assembly

Manuel Martinez-sanchez

Journal of Microelectromechanical Systems, 2007

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Hybrid microassembly of chips on low precision patterns assisted by capillary self-alignment

Bo Chang, Q. Zhou

Proceedings of the ... IEEE/RSJ International Conference on Intelligent Robots and Systems. IEEE/RSJ International Conference on Intelligent Robots and Systems

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MEMS on cavity-SOI wafers

Altti Torkkeli

Solid-State Electronics, 2007

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Optimization of alignment in semiconductor lithography equipment

Youzou Fukagawa

Precision Engineering, 2009

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Lithographic process window optimization for mask aligner proximity lithography

Marc Hennemeyer

2014

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Design and realization of a photolithography alignment and uv exposure equipement for pedagogical and laboratory experiment purposes

N. Ordonez, Nilton Morimoto

J3eA, 2008

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IJERT-Review: MEMS Fabrication Technology

IJERT Journal

International Journal of Engineering Research and Technology (IJERT), 2013

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Applications to MEMS and biochips fabrication

Elie Bou Chakra

2016

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Evaluation of fabrication process for a novel Chip-to-Wafer (C2W) 3D integration approach using an alignment template

Jian-qiang Lu

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MEMS integrated submount alignment for optoelectronics

Parsaoran Hutapea

Journal of Lightwave Technology, 2000

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In-Line Dimensional Metrology for Nanomanufacturing Systems Enabled By A Passive Semiconductor Wafer Alignment Mechanism

Tsung-Fu Yao

Journal of Micro and Nano-Manufacturing, 2016

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Evaluation of alignment accuracy on chip-to-wafer self-assembly and mechanism on the direct chip bonding at room temperature

MURUGESAN MARIAPPAN

2010 IEEE International 3D Systems Integration Conference (3DIC)

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CMOS chip planarization by chemical mechanical polishing for a vertically stacked metal MEMS integration

Michele Miller

Journal of Micromechanics and Microengineering, 2004

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Improved alignment algorithm for electron beam lithography

Stephen Thoms

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2014

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Self-alignment of silicon chips on wafers: A capillary approach

K. Brakke

Journal of Applied Physics, 2010

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Study on MEMS Fabrication Techniques and Applications.

Ijesrt Journal

International Journal of Engineering Sciences & Research Technology, 2013

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Resist deposition without spinning by using novel inkjet technology and direct lithography for MEMS

Butrus Khuri-Yakub

Proceedings of SPIE, 1998

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A Low-Cost, Automated Wafer Loading System With Submicron Alignment Accuracy for Nanomanufacturing and Nanometrology Applications

Tsung-Fu Yao

Journal of Micro and Nano-Manufacturing, 2016

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Advanced Techniques in 3D Photolithography for MEMS

Lance Mosher, Christopher Waits

2006

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Photoresist microbridge pattern optimization at 1μm using conventional photolithography technique

Uda Hashim

RSM 2013 IEEE Regional Symposium on Micro and Nanoelectronics, 2013

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Using computational methods for mask aligner lithography

Ulrich Hofmann

SPIE Newsroom, 2012

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Principles of Photolithography in Semiconductor Manufacturing

Duta Jaizul-Aziz

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Concept, construction and commissioning of an alignment system for deep X-ray lithography

Alexei Bogdanov

Microelectronic Engineering, 2002

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Patterning of nanometer structures by using direct-write e-beam lithography for the sensor development

Jaroslav Noskovic, A. Pidík, M. Štefečka, Ivan Kostic

2010

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