Selective epitaxial growth of GaAs on Ge by MOCVD (original) (raw)

Characterization of GaAs grown by molecular beam epitaxy on vicinal Ge(100) substrates

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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004

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Heavily doped and fully compensated Ge single-crystalline films on GaAs

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Effect of film growth rate and thickness on properties of Ge/GaAs(100) thin films

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Richard Gilbert

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Electron-paramagnetic-resonance study of GaAs grown by low-temperature molecular-beam epitaxy

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X-ray diffraction studies of GaAs implanted with 1.5MeV Se+ ions

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Thermal annealing behaviour of deep levels in as-grown p-type MOCVD GaAs

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Step edge barriers versus step edge relaxation in GaAs:Sn molecular beam epitaxy

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The compensation and depletion behavior of iron doped GaAs grown by molecular beam epitaxy

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Low Temperature Growth GaAs on Ge

Patrick McNally

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Investigation of the Substrate/Epitaxial Interface of Si/Si 1-x Ge x Layers Grown by LPCVD

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Mechanisms of GaAsN growth: Surface and step-edge diffusion

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Characterization of Ge Films on Si(001) Substrates Grown by Nanocontact Epitaxy

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Chemical Beam Epitaxy of Compound Semiconductors

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1990

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Ge Epitaxial Growth on GaAs Substrates for Application to Ge-Source/Drain GaAs MOSFETs

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Characterization of CdTe Growth on GaAs Using Different Etching Techniques

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Evaluation of atomic displacement in ion implanted GaAs

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A GaAs metalorganic vapor phase epitaxy growth process to reduce Ge outdiffusion from the Ge substrate

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