Plasma deposition of amorphous silicon alloys from fluorinated gases (original) (raw)
RE plasma deposition of amorphous silicon-germanium alloys: evidence for a chemisorption-based growth process
Giovanni Bruno
IEEE Transactions on Plasma Science, 1990
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Plasma deposition of amorphous SiC:H,F alloys from SiF4‐CH4‐H2 mixtures under modulated conditions
Giovanni Bruno
Journal of Applied Physics
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On the use of SiF4 as silicon source for amorphous silicon alloys deposition
Luigi Schiavulli
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Plasma deposition of amorphous silicon films: an overview on some open questions
Giovanni Bruno
Pure and Applied Chemistry, 2000
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Fabrication of Polycrystalline Silicon Films from SiF4/H2/SiH4Gas Mixture Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties
Charles Fortmann
Japanese Journal of Applied Physics, 2000
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Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetrafluoride
Giovanni Bruno
Journal of Vacuum Science & Technology A, 2001
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The mechanism of plasma-induced deposition of amorphous silicon from silane
Stan Vepřek
Plasma Chemistry and Plasma Processing, 1990
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Growth-etching competitive mechanism governing the structure and chemical composition of plasma-deposited silicon-based materials
P. Capezzuto
Philosophical Magazine B, 2000
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From Amorphous to Microcrystalline Silicon: Moving From One to the Other by Halogenated Silicon Plasma Chemistry
Giovanni Bruno
Philosophical …, 2009
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Stoichiometric limitations of RF plasma deposited amorphous silicon-nitrogen alloys
S. Ravi P. Silva
Thin Solid Films, 1997
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From amorphous to microcrystalline silicon deposition in SiF4–H2–He plasmas: in situ control by optical emission spectroscopy
Giovanni Bruno
Thin Solid Films, 2001
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Precursors for the deposition of amorphous silicon–hydrogen alloys by remote plasma enhanced chemical vapor deposition
David Tsu
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1989
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Amorphous silicon germanium alloy film deposition with in situ plasma diagnostics
Eugene Allevato
Solar Cells, 1988
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Growth chemistry of SiC alloys from SiF4–CH4 plasmas
Giovanni Bruno
Applied Surface Science, 2001
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Enhancement of the amorphous to microcrystalline phase transition in silicon films deposited by SiF4-H2-He plasmas
G. Bruno, Teresa Ligonzo
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PARAMETERS CONTROLLING THE DEPOSITION OF AMORPHOUS AND MICROCRYSTALLINE SILICON IN Si/H DISCHARGE PLASMAS
Stan Vepřek
Le Journal de Physique Colloques, 1981
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Study of SiF4-N2-H2 plasmas for the deposition of fluorinated silicon nitride films
Giovanni Bruno
MRS Online Proceeding Library
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Optical and compositional properties of amorphous silicon-germanium films by plasma processing for integrated photonics
Claudia Reyes-Betanzo
Optical Materials Express, 2012
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Silicon Chemistry in Fluorinated Chemical Vapor Deposition of Silicon Carbide
olof kordina
The Journal of Physical Chemistry C, 2017
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Plasma enhanced chemical vapor deposition of nanocrystalline silicon films from SiF 4-H 2He at low temperature
Giovanni Bruno
Thin Solid Films, 1999
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Physical properties of amorphous silicon-carbon alloys produced by different techniques
Paolo Rava
Journal of Materials Research, 1990
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Deposition of silicon-germanium alloys under plasma modulation conditions
Giovanni Bruno
Journal of Non-Crystalline Solids, 1991
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Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition
wanderla scopel
2001
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Radiofrequency-plasma-deposited hydrogenated fluorinated silicon-carbon alloy films
Gautam Ganguly
Physical Review B, 1989
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Plasma deposition and characterization of photoluminescent fluorinated nanocrystalline silicon films
Giovanni Bruno
Journal of Applied Physics, 1996
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Hydrogenated amorphous silicon–carbon alloys obtained from Ar–SiH4–CH4 gas mixtures: Structural and transport properties
Ayana Bhaduri
Journal of Non-Crystalline Solids, 2006
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Amorphous silicon-carbon-fluorine alloy films
Ruma Dutta
Physical Review B, 1983
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Properties of amorphous carbon–silicon alloys deposited by a high plasma density source
Neil Morrison
Journal of Applied Physics, 2001
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Role of fluorocarbon film formation in the etching of silicon, silicon dioxide, silicon nitride, and amorphous hydrogenated silicon carbide
Theodorus Standaert/Fishkill/Ibm, E. Joseph, Timothy Dalton
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2004
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Modification of (111) and (100) silicon in atmospheric pressure plasma
Dana Skacelova
Applied Surface Science, 2014
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Characterization of Si-rich a-Si1−xNx:H alloys deposited by laser-CVD
Stefano Chiussi
Applied Surface Science, 1999
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Amorphous Hydrogenated Alloys: A Comparative Exafs Study of a-Si1-xCx:H, a-Si1-xGex:H, a-SiNx:H at the Silicon K-Edge
Settimio Mobilio
Seventh E.C. Photovoltaic Solar Energy Conference, 1987
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