Synthesis and evaluation of novel organoelement resists for EUV lithography (original) (raw)

2003, Proceedings of SPIE - The International Society for Optical Engineering

Design and Synthesis of Novel Resist Materials for EUVL

The design, synthesis and characterization of non-chemically amplified negative tone electron-beam and EUV resists based on the inclusion of a radiation sensitive sulfonium functional group are outlined.. MAPDST (4-(methacryloyloxy)phenyldimethylsulfoniumtriflate) and MANTMS (1-(4-(methacryloyloxy)naphthalen-1-yl)tetrahydro-1H-thiopheniumtrifluoromethane sulfonate) monomers each containing the sulfonium group underwent homo-and copolymerizations using free radical polymerization with 2,2'-azobisisobutyronitrile (AIBN) initiator. These resist materials were evaluated by EB lithography using 20 keV electron beam and EUV lithography to obtain sub-20 nm line patterns. These features were optimized ranging from resist coating, pre-exposure bake, exposure to e-beam, post-exposure bake, development and imaging. Our investigation showed that these newly synthesized resists are potential viable candidates for EUV lithography based on their ability to form flaw free thin films < 50nm, sensitivity, resolution and LER control.

High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results

Nanomaterials

The need for decreasing semiconductor device critical dimensions at feature sizes below the 20 nm resolution limit has led the semiconductor industry to adopt extreme ultra violet (EUV) lithography with exposure at 13.5 nm as the main next generation lithographic technology. The broad consensus on this direction has triggered a dramatic increase of interest on resist materials of high sensitivity especially designed for use in the EUV spectral region in order to meet the strict requirements needed for overcoming the source brightness issues and securing the cost efficiency of the technology. To this direction both fundamental studies on the radiation induced chemistry in this spectral area and a plethora of new ideas targeting at the design of new highly sensitive and top performing resists have been proposed. Besides the traditional areas of acid-catalyzed chemically amplified resists and the resists based on polymer backbone breaking new unconventional ideas have been proposed bas...

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