Amorphous inclusions during Ge and GeSn epitaxial growth via chemical vapor deposition (original) (raw)
Epitaxial growth of Ge on a thin SiO2 layer by ultrahigh vacuum chemical vapor deposition
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Surface Morphology during Multilayer Epitaxial Growth of Ge(001)
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Low temperature growth of the epitaxial Ge layers on Si(100) by Hot Wire Chemical Vapor Deposition
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Eric Ganz
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On the relation between low-temperature epitaxial growth conditions and the surface morphology of epitaxial Si and Si1−xGex layers, grown in an ultrahigh vacuum, very low pressure chemical vapour deposition reactor
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Thin Solid Films, 1994
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Epitaxial Crystallization of Ge on Si Using Evaporation and Recrystallization Techniques
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