Computational Lithography for Silicon Photonics Design (original) (raw)

Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization

Kafai Lai

Advanced Optical Technologies, 2012

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Comparison of scalar and vector diffraction modeling for deep-UV lithography

Donis Flagello

SPIE Proceedings, 1993

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Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography

Roel Baets

IEEE Journal of Selected Topics in Quantum Electronics, 2002

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Nanofabrication with deep-ultraviolet lithography and resolution enhancements

Josef Knecht

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999

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Applying deep ultraviolet lithography

Mike Tipton

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1990

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193NM Immersion Lithography for High-Performance Silicon Photonic Circuits

Alexey Milenin

SPIE Proceedings, 2014

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Low-loss grating-coupled optical interfaces for large-volume fabrication with deep-ultraviolet optical lithography

Sylvain Guerber

2018

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Deep ultraviolet laser metrology for semiconductor photolithography

Marla Dowell

The 1998 international conference on characterization and metrology for ULSI technology, 1998

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Fabrication of uniform photonic devices using 193nm optical lithography in silicon-on-insulator

Shankar Selvaraja

2008

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Impact of 14-nm photomask uncertainties on computational lithography solutions

Steffen Schulze

Journal of Micro/Nanolithography, MEMS, and MOEMS, 2013

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Optical and EUV projection lithography: A computational view

Viviana Agudelo

Microelectronic Engineering, 2015

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In-situ metrology for deep-ultraviolet lithography process control

Xinhui Niu

SPIE Proceedings, 1998

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Photonic device sensitivity analysis methods: towards process variation-aware silicon photonics design

Duane S Boning

Optical Modeling and System Alignment, 2019

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Extension of deep-ultraviolet lithography for patterning logic gates using alternating phase shifting masks

Anthony Yen

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1999

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Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node

Nishrin Kachwala

1998

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Deep-ultraviolet lithography simulator tuning by resist profile matching

Costas Spanos

Lithography for Semiconductor Manufacturing, 1999

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True process variation aware optical proximity correction with variational lithography modeling and model calibration

David Pan

Journal of Micro/Nanolithography, MEMS, and MOEMS, 2007

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Exposing extreme ultraviolet lithography at Intel

Wang Yueh, Manish Chandhok, Bryan Rice, Uday Shah

Microelectronic Engineering, 2006

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Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node

Nishrin Kachwala

Proceedings of SPIE, 1999

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Physical and technological limits in optical and x-ray lithography

Wolfgang Arden

Microelectronic Engineering, 1987

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Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography

Jonathan Cobb

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003

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Next-generation lithography for 22 and 16 nm technology nodes and beyond

Banqiu Wu

Science in China Series F: Information Sciences, 2011

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EUV Lithography: Patterning to the End of the Road

Paul Dentinger

MRS Proceedings, 2001

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Novel design methods for high-quality lithographic objectives

Oana Marinescu

2006

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Accuracy of 3D optical lithography simulation for advanced reticles

Richard Hollman

Proceedings of SPIE, 1997

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EUV Lithography at the 22-nm technology node

Chiew-Seng Koay

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Inverse lithography as a DFM tool: accelerating design rule development with model-based assist feature placement, fast optical proximity correction and lithographic hotspot detection

Timothy Lin, Bob Gleason, Thuc Dam

Proceedings of SPIE - The International Society for Optical Engineering

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Fabrication of photonic wire and crystal circuits in silicon-on-insulator using 193-nm optical lithography

shankar kumar

Lightwave …, 2009

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Pushing extreme ultraviolet lithography development beyond 22 nm half pitch

Patrick Naulleau

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2009

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Efficient and rigorous three-dimensional model for optical lithography simulation

Kevin Lucas

Journal of The Optical Society of America, 1996

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