Control of semiconductor manufacturing equipment: real-time feedback control of a reactive ion etcher (original) (raw)
Related papers
Real-time plasma control in a dual-frequency, confined plasma etcher
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2003
Sensor systems for real‐time feedback control of reactive ion etching
1996
Discrete-time control system design for a Reactive Ion Etching (RIE) system
2003 IEEE International Workshop on Workload Characterization (IEEE Cat. No.03EX775), 2003
Real-time virtual metrology and control of etch rate in an industrial plasma chamber
2012 IEEE International Conference on Control Applications, 2012
IEEE Transactions on Semiconductor Manufacturing, 2010
Towards closed loop control of a plasma tool using OES
Microelectronic Engineering, 2009
Real-time Virtual Metrology and Control for Plasma Etch
On the closed-loop control of an argon plasma process
Irish Signals and …, 2006
Robust two-time scale control system design for reactive Ion etching system
2003 European Control Conference (ECC), 2003
Development of an Emulator for the Plasma Process Control
Journal of Mechanics Engineering and Automation, 2015
PhD Thesis - Virtual Metrology for Plasma Etch Processes
ELIMINATION OF THE RIE 1 ST WAFER EFFECT: REAL-TIME CONTROL OF PLASMA DENSITY
Estimation and control in semiconductor etch: Practice and possibilities
giorgio bacelli, John Ringwood
Semiconductor …, 2010
On the modeling and closed loop control of an inductively coupled plasma chamber
IFAC Workshop on …, 2006
Electrical and plasma property measurements of a deep reactive ion etching Bosch process
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2003
Modelling for control of induction plasma deposition
Chemical Engineering Science, 1995
In-situ process control for semiconductor manufacturing
Proceedings of the 2002 American Control Conference (IEEE Cat. No.CH37301), 2002
Contributions to Plasma Physics, 2012
Computers & Chemical Engineering, 2014
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
Vacuum, 2011
Nonlinear Control Design for a Plasma Process
Decision and Control, 2005 …, 2005
Korean Journal of Chemical Engineering, 2000