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C. Wyon
Surface and Interface Analysis, 2008
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Quantitative static Time-of-Flight Secondary Ion Mass Spectrometry analysis of anionic minority species in microelectronic substrates
C. Wyon
Applied Surface Science, 2008
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Letter: A simple ion source set-up for desorption/ionization on silicon with ion mobility spectrometry and ion mobility spectrometry-mass spectrometry
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European Journal of Mass Spectrometry, 2011
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Determination of organic contaminations on Si wafer surfaces by static ToF-SIMS: Improvement of the detection limit with C60+ primary ions
Claude Poleunis
Applied Surface Science, 2006
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Evaluation of Accelerator-based Secondary Ion Mass Spectrometry for the Ultra-trace Elemental Characterization of Bulk Silicon
Graham Wilson
1986
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Comparison of secondary ion emission induced in silicon oxide by MeV and keV ion bombardment
Wilfried Szymczak
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1994
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Ion yields and erosion rates for Si1−xGex(≤x≤1) ultralow energy O2+ secondary ion mass spectrometry in the energy range of 0.25–1 keV
Sir. Richard yatta Morris
Journal of Applied Physics, 2009
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Formation of High-Mass Cluster Ions from Compound Semiconductors Using Time-of-Flight Secondary Ion Mass Spectrometry with Cluster Primary Ions
Joseph Gardella
Analytical Chemistry, 2008
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A comparative secondary ion mass spectrometry technique for evaluation of metallic impurity on silicon surface
Mohamed Ketata
Materials Science and Engineering: B, 1995
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Secondary ion mass spectrometry with gas cluster ion beams
Takaaki Aoki
Applied Surface Science, 2003
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The effect of incident cluster ion energy and size on secondary ion yields emitted from Si
Takaaki Aoki
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2007
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Time-of-Flight Secondary Ion Mass Spectroscopic Analysis of Surface Contamination
IJSES Editor
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Time-of-flight secondary ion mass spectroscopy for surface analysis of insulators using a cluster ion beam
Joseph Gardella
Applied Physics Letters, 2003
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Charge stabilization and ion trapping under specimen isolation conditions during Sims analysis
Paul van der heide
Surface and Interface Analysis, 1992
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A mixed cluster ion beam to enhance the ionization efficiency in molecular secondary ion mass spectrometry
Nicholas Winograd
Rapid Communications in Mass Spectrometry, 2013
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Secondary ion mass spectrometry depth profiling of ultrathick films using an argon gas cluster source: Crater shape implications on the analysis area as a function of depth
Cayla Collett
Surface and Interface Analysis, 2018
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Deconvolution analyses of secondary ion mass spectrometry shallow depth profiles with depth resolution functions from silicon substrate-based delta-doped samples
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2009
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Secondary ion mass spectrometry using cluster primary ion beams
Greg Gillen
2003
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Surface Analysis Studies of Yield Enhancements in Secondary Ion Mass Spectrometry by Polyatomic Projectiles †
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The Journal of Physical Chemistry B, 2001
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Enhanced surface sensitivity in secondary ion mass spectrometric analysis of organic thin films using size-selected Ar gas-cluster ion projectiles
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Rapid Communications in Mass Spectrometry, 2010
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Experimental Factors Controlling Analyte Ion Generation in Laser Desorption/Ionization Mass Spectrometry on Porous Silicon
Paul Bohn
Analytical Chemistry, 2001
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New Cs sputter ion source with polyatomic ion beams for secondary ion mass spectrometry applications
Fred Adams
Review of Scientific Instruments, 2007
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Study of ion beam induced chemical effects in silicon with a downsized high resolution X-ray spectrometer for use with focused ion beams
tonci tadic
Journal of Analytical Atomic Spectrometry, 2016
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Investigation of the factors determining the SIMS depth resolution in silicon-isotope multiple layers
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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 2012
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Determination of oxygen in silicon in the sub-part-per-million range by charged-particle activation analysis
Emile Schweikert
Analytical Chemistry, 1970
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Characterization of high explosive particles using cluster secondary ion mass spectrometry
Scott Wight, Christine Mahoney
Rapid Communications in Mass Spectrometry, 2006
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Mass spectrometry on the nanoscale with ion sputtering based techniques: What is feasible
Michael Pellin
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2007
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Highly sensitive analysis of surface contaminants by Ar gas cluster SIMS
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Surface and Interface Analysis, 2012
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Investigation of the cluster ion formation process for inorganic compounds in static SIMS
Claude Poleunis
Applied Surface Science, 2003
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Near-surface secondary-ion-mass-spectrometry analyses of plasma-based B ion implants in Si
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2006
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Secondary Ion Mass Spectrometry
Nathalie Valle
Analytica Chimica Acta, 1993
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Heavy ion backscattering spectrometry at the University of Central Florida
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Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2004
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Advances in Ionization for Mass Spectrometry
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Analytical Chemistry, 2017
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