Highly sensitive analysis of surface contaminants by Ar gas cluster SIMS (original) (raw)

Enhanced surface sensitivity in secondary ion mass spectrometric analysis of organic thin films using size-selected Ar gas-cluster ion projectiles

Kousuke Moritani

Rapid Communications in Mass Spectrometry, 2010

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Site-Specific Fragmentation of Polystyrene Molecule Using Size-Selected Ar Gas Cluster Ion Beam

Kousuke Moritani

Applied Physics Express, 2009

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Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams

Takaaki Aoki

Rapid Communications in Mass Spectrometry, 2009

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Examination of ion beam induced damage on polymer surface using Ar clusters

Satoka Aoyagi

Surface and Interface Analysis, 2016

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Secondary ion mass spectrometry with gas cluster ion beams

Takaaki Aoki

Applied Surface Science, 2003

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Secondary ion mass spectrometry depth profiling of ultrathick films using an argon gas cluster source: Crater shape implications on the analysis area as a function of depth

Cayla Collett

Surface and Interface Analysis, 2018

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Measurements of secondary ions emitted from organic compounds bombarded with large gas cluster ions

Takaaki Aoki

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2007

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Secondary ion mass spectrometry study of silicon surface preparation and the polystyrene/silicon interface

Y. Strzhemechny

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1997

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Argon Cluster Ion Beams for Organic Depth Profiling: Results from a VAMAS Interlaboratory Study

Derk Rading

Analytical Chemistry, 2012

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A mixed cluster ion beam to enhance the ionization efficiency in molecular secondary ion mass spectrometry

Nicholas Winograd

Rapid Communications in Mass Spectrometry, 2013

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Effects of Metal Nanoparticles on the Secondary Ion Yields of a Model Alkane Molecule upon Atomic and Polyatomic Projectiles in Secondary Ion Mass Spectrometry

Arnaud Delcorte

Analytical Chemistry, 2008

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Secondary Ion Mass Spectrometry of Organic Thin Films Using Metal-Cluster-Complex Ion Source

Toshiyuki Fujimoto

Japanese Journal of Applied Physics, 2006

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Time of flight secondary ion mass spectrometric determination of molecular weight distributions of low polydispersity poly(dimethyl siloxane) with polyatomic primary ions

Joseph Gardella

Journal of the American Society for Mass Spectrometry, 2009

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Depth profiling organic/inorganic interfaces by argon gas cluster ion beams: sputter yield data for biomaterials, in-vitro diagnostic and implant applications

Peter Cumpson

Surface and Interface Analysis, 2013

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An Introduction to Cluster Secondary Ion Mass Spectrometry (Cluster SIMS)

Greg Gillen

Principles and Applications, 2013

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Secondary ion mass spectrometry using cluster primary ion beams

Greg Gillen

2003

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Surface Analysis Studies of Yield Enhancements in Secondary Ion Mass Spectrometry by Polyatomic Projectiles †

Greg Gillen

The Journal of Physical Chemistry B, 2001

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Static time-of-flight secondary ion mass spectrometry analysis of microelectronics related substrates using a polyatomic ion source

C. Wyon

Applied Surface Science, 2008

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Temperature-controlled depth profiling of poly (methyl methacrylate) using cluster secondary ion mass spectrometry. 1. Investigation of depth profile characteristics

Greg Gillen

2007

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Effects of Tailored Surface Chemistry on Desorption Electrospray Ionization Mass Spectrometry: a Surface-Analytical Study by XPS and AFM

Antonella Rossi

Journal of the American Society for Mass Spectrometry, 2015

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Volatile polydimethylcyclosiloxanes in the ambient laboratory air identified as source of extreme background signals in nanoelectrospray mass spectrometry

Rudolf Volkmer

Journal of Mass Spectrometry, 2003

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Cluster Secondary Ion Mass Spectrometry

Nicholas Winograd

Surface Analysis and Techniques in Biology, 2014

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Temperature-controlled depth profiling in polymeric materials using cluster secondary ion mass spectrometry (SIMS)

Christine Mahoney, Greg Gillen

Applied Surface Science, 2006

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Fragmentation of molecular compounds on silicon wafers and low dielectric constant materials studied by time-of-flight secondary ion mass spectrometry using a polyatomic ion source

C. Wyon

Surface and Interface Analysis, 2008

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Material dependence of argon cluster ion sputter yield in polymers: Method and measurements of relative sputter yields for 19 polymers

Jose Portoles

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2013

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Laser desorption/ionization Fourier transform mass spectrometry of thin films deposited on silicon by plasma polymerization of acetylene

Fabrizio Maseri

Journal of the American Society for Mass Spectrometry, 2010

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Static secondary ion mass spectrometry of polymer systems

Joseph Gardella

Anal Chem, 1980

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Investigation of polymer thin films by use of Bi-cluster-ion-supported time of flight secondary ion mass spectrometry

Herbert Hutter

Analytical and Bioanalytical Chemistry, 2009

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Mass spectrometry on the nanoscale with ion sputtering based techniques: What is feasible

Michael Pellin

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2007

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XPS depth profiling of organic photodetectors with the gas cluster ion beam

Amélie Revaux

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2016

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Automated analysis of organic particles using cluster SIMS

Christine Mahoney

Applied Surface Science, 2004

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Improving Secondary Ion Mass Spectrometry C 60 n + Sputter Depth Profiling of Challenging Polymers with Nitric Oxide Gas Dosing

A. Licciardello, James S Sharp

Analytical Chemistry, 2013

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