Modifications of He implantation induced cavities in silicon by MeV silicon implantation (original) (raw)

The evolution of cavities in Si co-implanted with Si and He ions1

Alain Claverie

Materials Science and Engineering: B, 2003

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Stability of cavities formed by He + implantation in silicon

Fabrice ROQUETA

Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms, 1999

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Defect evolution in MeV ion-implanted silicon

Chennupati Jagadish

Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms - NUCL INSTRUM METH PHYS RES B, 1996

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Point defects observed in crystalline silicon implanted by MeV Si ions at elevated temperatures

Chennupati Jagadish

Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms, 1995

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Annealing studies of point defects in low dose MeV ion implanted silicon

Chennupati Jagadish

Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms - NUCL INSTRUM METH PHYS RES B, 1997

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The formation, migration, agglomeration and annealing of vacancy-type defects in self-implanted Si

Jilin Tan

Journal of Materials Science: Materials in Electronics, 2007

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Cavities at the Si projected range by high dose and energy Si ion implantation in Si

Gabrielle Regula

Materials Science and Engineering: B, 2009

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DLTS and EPR study of defects in H implanted silicon

Hrvoje Zorc, Boris Rakvin

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2002

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Mechanism for the reduction of interstitial supersaturations in MeV-implanted silicon

Lourdes Pelaz

Applied Physics Letters, 1999

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New Insight into Damage-Related Phenomena in Si Implanted Under Extreme Conditions

Bent Nielsen

MRS Proceedings, 1995

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Thermal stability of defect complexes due to high dose MeV implantation in silicon

Yashowanta N. Mohapatra

Materials Science and Engineering: B, 2000

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Electrical and optical characterization of extended defects induced in p-type Si after Si ion implantation

cloud nyamhere

physica status solidi (c), 2013

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Compensating defect in deep buried layers produced by MeV heavy ions in n-silicon

PK Giri

Applied Physics Letters, 1997

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Structural characterisation of self-implanted Si after HT-HP treatment

Witold Rzodkiewicz

Materials Science and Engineering: B, 2005

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EPR and X-ray diffraction study of damage produced by implantation of B ions (50 keV, 1 MeV) or Si ions (50 keV, 700 keV, 1.5 MeV) into silicon

R. Nipoti

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1995

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Influence of the chemical nature of implanted ions on the structure of a silicon layer damaged by implantation

Виктор Мордкович, Kirill Shcherbachev

Crystallography Reports, 2013

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Investigation of Ion implantation induced electrically active defects in p-type silicon

Jayantha Senawiratne

2009 IEEE International SOI Conference, 2009

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Formation and annealing of defects during high-temperature processing of ion-implanted epitaxial silicon: the role of dopant implants

E. Rimini

Materials Science and Engineering: B, 2000

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Electrical characterisation and predictive simulation of defects induced by keV Si+ implantation in n-type Si

cloud nyamhere

Journal of Applied Physics, 2013

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The structures prepared by high temperature–pressure treatment of Cz-Si heavily implanted with He+

V. Zavodinsky

Journal of Alloys and Compounds, 2005

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Damage profiles of MeV implants of Ga and Si in silicon

David Ingram

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987

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Damage to Crystalline Silicon Following Implantation by Low Energy Silicon Ions

Nicole Herbots

MRS Proceedings, 1992

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Evolution of He-induced cavities and related defects in silicon studied by direct scattering of channeled particles

Fabrice ROQUETA

The European Physical Journal Applied Physics, 2002

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Gettering of Diffused Au and of Cu and Ni Contamination in Silicon by Cavities Induced by High Energy He Implantation

Gabrielle Regula

physica status solidi (b), 2000

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GISAXS study of defects in He implanted silicon

Giorgio Ottaviani

Materials Science and Engineering: B, 2000

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Depth Profiling of Defects in He Implanted SiO2

Marco Duarte Naia

Acta Physica Polonica A, 2008

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