| dbo:abstract |
Die Nanoprägelithografie (englisch nanoimprint lithography, kurz NIL) ist ein Nanolithografie-Verfahren zum kostengünstigen Herstellen von mittels eines nanostrukturierten Stempels. Als Positiv werden häufig Monomere oder Polymere verwendet, die nach dem Prägen aushärten müssen. Anwendung findet die Nanoprägelithografie in der Herstellung elektronischer und opto-elektronischer Bauteile. (de) Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release. (en) ナノインプリント・リソグラフィとは現在開発が進められている半導体の微細パターン転写技術である。 従来のパターン作成には縮小投影型露光装置 (ステッパー)が使用されていたが、微細化に伴い、極端紫外線露光装置の価格とパターンマスクの価格が高騰していて、導入に躊躇する半導体メーカーが続出しており、普及の妨げになっていた。ナノインプリント・リソグラフィが普及すれば生産性が向上し、半導体の製造コストの低減に大きく貢献する事が予想される。 一方、インプリント・リソグラフィには『パーシャルフィールド』という特有の問題もある。 (ja) A litografia por nanoimpressão (ou NIL, do termo em inglês nanoimprint lithography) é um método de fabricação de padrões em escala nanométrica. É um processo simples de nanolitografia com baixo custo, alto rendimento e alta resolução. Ele cria padrões por deformação mecânica do de impressão e processos subsequentes. A máscara de impressão é tipicamente um monômero ou uma formulação de polímero que é curada por calor ou por luz ultravioleta durante a impressão. A adesão entre o resiste e o molde é controlada para permitir uma liberação adequada. (pt) Нанопечатная литография (англ. nanoimprint lithography) — технология, предназначенная для переноса изображения наноструктуры или электронной схемы на подложку с покрытием и включающая деформацию покрытия штампом с последующим травлением деформированного покрытия и формированием на подложке наноструктуры или элементов электронной схемы. (ru) |
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http://news.bbc.co.uk/1/hi/scotland/glasgow_and_west/7162606.stm http://spie.org/documents/Newsroom/Imported/006543/006543_10.pdf |
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The mold used (en) The resulting lens (en) |
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A diffractive lens created using nanoimprint lithography (en) |
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Kinoform optical lens.png (en) Nanoimprint mold of a diffractive lens.png (en) |
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| rdfs:comment |
Die Nanoprägelithografie (englisch nanoimprint lithography, kurz NIL) ist ein Nanolithografie-Verfahren zum kostengünstigen Herstellen von mittels eines nanostrukturierten Stempels. Als Positiv werden häufig Monomere oder Polymere verwendet, die nach dem Prägen aushärten müssen. Anwendung findet die Nanoprägelithografie in der Herstellung elektronischer und opto-elektronischer Bauteile. (de) Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release. (en) ナノインプリント・リソグラフィとは現在開発が進められている半導体の微細パターン転写技術である。 従来のパターン作成には縮小投影型露光装置 (ステッパー)が使用されていたが、微細化に伴い、極端紫外線露光装置の価格とパターンマスクの価格が高騰していて、導入に躊躇する半導体メーカーが続出しており、普及の妨げになっていた。ナノインプリント・リソグラフィが普及すれば生産性が向上し、半導体の製造コストの低減に大きく貢献する事が予想される。 一方、インプリント・リソグラフィには『パーシャルフィールド』という特有の問題もある。 (ja) A litografia por nanoimpressão (ou NIL, do termo em inglês nanoimprint lithography) é um método de fabricação de padrões em escala nanométrica. É um processo simples de nanolitografia com baixo custo, alto rendimento e alta resolução. Ele cria padrões por deformação mecânica do de impressão e processos subsequentes. A máscara de impressão é tipicamente um monômero ou uma formulação de polímero que é curada por calor ou por luz ultravioleta durante a impressão. A adesão entre o resiste e o molde é controlada para permitir uma liberação adequada. (pt) Нанопечатная литография (англ. nanoimprint lithography) — технология, предназначенная для переноса изображения наноструктуры или электронной схемы на подложку с покрытием и включающая деформацию покрытия штампом с последующим травлением деформированного покрытия и формированием на подложке наноструктуры или элементов электронной схемы. (ru) |
| rdfs:label |
Nanoprägelithografie (de) ナノインプリント・リソグラフィ (ja) Nanoimprint lithography (en) Litografia por nanoimpressão (pt) Нанопечатная литография (ru) |
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