Fabrication of x-ray masks using evaporated electron sensitive layers for back patterning of membranes (original) (raw)

Sub‐100‐nm x‐ray mask technology using focused‐ion‐beam lithography

Anthony Yen

1989

View PDFchevron_right

Masks for X-Ray-Lithography with a Point-Source Stepper

George Celler

Journal of Vacuum Science & Technology B, 1992

View PDFchevron_right

Fabrication of X-Ray Masks Using the Silicon Direct Write Electron-Beam Lithography Process and Complementary Electron-Sensitive Resists

Yousef Awad

Japanese Journal of Applied Physics, 2002

View PDFchevron_right

3D microstructures fabricated by partially opaque X-ray lithography masks

Stefano Cabrini

Microelectronic Engineering, 2000

View PDFchevron_right

Fabrication of the X-Ray Mask using the Silicon Dry Etching

Hiroshi Tsujii

Journal of Advanced Mechanical Design Systems and Manufacturing, 2008

View PDFchevron_right

Modeling of electron beam scattering in high resolution lithography for the fabrication of X-Ray masks

Saveria Santangelo

European Transactions on Telecommunications, 1990

View PDFchevron_right

Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes

Roxann Engelstad

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1996

View PDFchevron_right

Mask technologies for soft-x-ray projection lithography at 13 nm

Alastair MacDowell

Applied Optics, 1993

View PDFchevron_right

Article Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography

Harutaka Mekaru

2016

View PDFchevron_right

Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography

Harutaka Mekaru

Micromachines, 2015

View PDFchevron_right

X-ray lithography-an overview

juan maldonado

Proceedings of The IEEE, 1993

View PDFchevron_right

High resolution x-ray masks for high aspect ratio microelectromechanical systems (HARMS)

Flavio Aristone

Micromachining and Microfabrication Process Technology VIII, 2003

View PDFchevron_right

Polymer-based X-ray masks patterned by direct laser writing

Swathi Iyer Iyer

Review of Scientific Instruments, 2018

View PDFchevron_right

Fast prototyping of high-aspect ratio, high-resolution X-ray masks by gas-assisted focused ion beam

Frank Hartley

Microsystem Technologies, 2003

View PDFchevron_right

Optical properties of x-ray lithography masks

J. Cuomo

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1990

View PDFchevron_right

Low-cost and high-resolution x-ray lithography utilizing a lift-off sputtered lead film mask on a Mylar substrate

Rungrueang Phatthanakun

Journal of …, 2010

View PDFchevron_right

An overview of x-ray lithography for use in semiconductor device preparation

US TANDON

Vacuum, 1991

View PDFchevron_right

Novel approach to zero-magnification x-ray mask replication

Roxann Engelstad

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1992

View PDFchevron_right

3-Dimensional Microstructure Fabrication using Multiple Moving Mask Deep X-ray Lithography Process

Osamu Tabata

IEEJ Transactions on Sensors and Micromachines, 2000

View PDFchevron_right

The fabrication of x-ray masks using proton beam writing

Herbert Moser

Journal of Micromechanics and Microengineering, 2008

View PDFchevron_right

Very low contrast X-ray masks for high resolution printing

Laurence Ferlazzo

Microelectronic Engineering, 1998

View PDFchevron_right

Nanometer x-ray lithography

Frank Hartley

Design, Characterization, and Packaging for MEMS and Microelectronics, 1999

View PDFchevron_right

X-ray Mask with SiC Membrane for LIGA Process

Osamu Tabata

IEEJ Transactions on Sensors and Micromachines, 1999

View PDFchevron_right

Enhanced adhesion buffer layer for deep x-ray lithography using hard x rays

Derrick C Mancini

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

View PDFchevron_right

Electrodeposition Assisted X-ray Lithography: Single Step Approach

Carlo Segre

View PDFchevron_right

Fabrication of HARM structures by deep-X-ray lithography using graphite mask technology

Kun Lian

Microsystem Technologies-micro-and Nanosystems-information Storage and Processing Systems, 2000

View PDFchevron_right

Silicon stencil masks for masked ion beam lithography proximity printing

Ivo W. Rangelow

Microelectronic Engineering, 1996

View PDFchevron_right

X-ray lathe: An X-ray lithographic exposure tool for nonplanar objects

Alan Feinerman

Journal of microelectromechanical systems, 1996

View PDFchevron_right

Masks for extreme ultraviolet lithography

Stephen Vernon

… , Proceedings of the …, 1998

View PDFchevron_right

Masked ion beam lithography for proximity printing

H. Vonach, E. Hammel

Microelectronic Engineering, 1996

View PDFchevron_right

Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resist

Anja Voigt

24th European Mask and Lithography Conference, 2008

View PDFchevron_right

Thermoelastic effects on x-ray lithography masks under pulsed irradiation

juan Maldonado

Microelectronic Engineering, 1990

View PDFchevron_right

Thermal management of masks for deep x-ray lithography

Derrick Mancini

High Heat Flux and Synchrotron Radiation Beamlines, 1997

View PDFchevron_right