Appendix 1 for Fuchs and Kirchain's Journal of Lightwave Technology paper, "Process Based Cost Modeling of Photonics Manufacture (original) (raw)

Semiconductor Device Fabrication Technology

Nikola Zlatanov

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Selective growth of InP in device fabrication

Robert Karlicek, Jr.

1992

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Lithography Options for the 32 nm Half Pitch Node and Beyond

Mieke Goethals, eric hendrickx

IEEE Transactions on Circuits and Systems I: Regular Papers, 2000

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Laser micromachining of through via interconnects in active die for 3D multichip module

Delin Chu

Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'

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Full-wafer technology-A new approach to large-scale laser fabrication and integration

Peter Wolf

IEEE Journal of Quantum Electronics, 1991

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Large area patterning of high density interconnects by novel UV-excimer lithography and photo patternable ORMOCER™-dielectrica

Arne Alping

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Semiconductor processing and manufacturing

Jeff Britt, Bulent Basol

Progress in Photovoltaics: Research and Applications, 1997

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Integrated optical and electronic interconnect printed circuit board manufacturing

D. Selviah, Shefiu S. Zakariyah, PhD, CEng, SMIEEE, MIET, AMIMA, AInstCT

Circuit …, 2008

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Novel Fabrication and Packaging Technologies

Marc Hennemeyer

2009

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Preparation and test of special surfaces for epi-ready InP wafers

Giacomo Torzo

Materials Science and Engineering: B, 1997

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Laser direct-write of embedded electronic components and circuits

Bhanu Pratap

SPIE Proceedings, 2005

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OES diagnostics as a universal technique to control the Si etching structures profile in ICP

Armenak Osipov

Scientific Reports, 2022

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A Review on Laser Processing in Electronic and MEMS Packaging

Ahsan Mian

Journal of Electronic Packaging, 2017

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Integrated optical and electronic interconnect PCB manufacturing research

D. Selviah, Shefiu S. Zakariyah, PhD, CEng, SMIEEE, MIET, AMIMA, AInstCT

Circuit …, 2010

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Lithography system evolution: a perspective on a methodology for the rapid determination of 0.25um process capability

Mark Neisser

Journal of Photopolymer Science and Technology

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MIT-OSU-HP Focus center on non-lithographic Technologies for MEMS and nEMS

James Stasiak

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Transfer of InP epilayers by wafer bonding

Klas Hjort

Journal of Crystal Growth, 2004

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Integration of InP and InGaAs on 300 mm Si Wafers Using Chemical Mechanical Planarization

Alexey Vert

ECS Journal of Solid State Science and Technology

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Advancement in Lithographic Techniques for Semiconductor Devices

Sakshi Singh

2021

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Vendor capability for low-thermal-expansion mask substrates for EUV lithography

Kenneth Blaedel

Emerging Lithographic Technologies VI, 2002

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Via and embedded resistor production in low cost lithographically printed substrates

David Harrison

1999 Proceedings. 49th Electronic Components and Technology Conference (Cat. No.99CH36299)

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Rapid laser prototyping of multichip modules

Brent Lunceford

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Submicron MOS process with 10:1 optical-projection printing and anisotropic dry etching

Wolfgang Arden

IEE Proceedings I Solid State and Electron Devices, 1983

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Characterization of wet etching process for In/sub 0.53/Ga/sub 0.47/As epitaxy layer using surface profiling technique

Sahbudin Shaari

2004 IEEE International Conference on Semiconductor Electronics, 2004

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3 Device Fabrication Technology 1

Meshal Alawein

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Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node

Nishrin Kachwala

1998

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Integrated optical interconnections on printed circuit boards

Gregor Langer

SPIE Newsroom, 2007

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Integration of Inline Single-side Wet Emitter Etch in PERC Cell Manufacturing

Victor Prajapati, J. Horzel

Energy Procedia, 2012

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Packaging Approach for Integrating 40/45-nm ELK Devices Into Wire Bond and Flip-Chip Packages

gaurav mehta

IEEE Transactions on Components, Packaging and Manufacturing Technology, 2011

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Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node

Nishrin Kachwala

Proceedings of SPIE, 1999

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Development and Implementation of C4NP Technology for 300 mm Wafers

Eric Perfecto, Sarah Knickerbocker

2007 Proceedings 57th Electronic Components and Technology Conference, 2007

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