Fused Silica Etching Research Papers (original) (raw)

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- Chemical Engineering, Analytical Chemistry, Protein Folding, Mass Spectrometry
- by Steven Brueck
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- Quantum Physics, Fused Silica Etching, Optical physics, Second Order
- by Alan Arai
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- Optics, Glass, Femtosecond Laser, Fiber Lasers
- by Hideo Mabuchi
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- Optics, Quantum Physics, Near Infrared, Atomic Force Microscopy
- by Hiroyoshi Minakuchi and +1
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- Engineering, Technology, Mass Transfer, Scanning Electron Microscopy
- by Rajeev Pattathil
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- Pattern Formation, Physical sciences, Fused Silica Etching, Long Range
- by Claudimir Lago
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- Engineering, Chemical Engineering, Analytical Chemistry, Technology
- by Thomas Huser
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- Quantum Physics, Femtosecond Laser, Fused Silica Etching, Structural Change

The bound electronic nonlinear refractive index, n2, and two-photon absorption (2PA) coefficient, β, are measured in a variety of inorganic dielectric solids at the four harmonics of the Nd:YAG laser using Z scan. The specific materials studied are: barium fluoride (BaF2), calcite (CaCO3), potassium bromide (KBr), lithium fluoride (LiF), magnesium fluoride (MgF2 ), sapphire (Al2O3), a tellurite glass (75%TeO2+20%ZnO+5%Na2O) and

- by Eric Van Stryland and +1
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- Magnesium, Ultraviolet, IEEE, Fused Silica Etching
- by Mingshan Lu
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- Engineering, Technology, Scanning Electron Microscopy, Zinc Oxide
- by Kazuki Nakanishi and +1
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- Engineering, Technology, Scanning Electron Microscopy, Morphology
- by Joseph Menapace
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- Materials Engineering, Materials Science, Fracture, Image Analysis

Ablation of fused silica using standard excimer lasers (20–30 ns pulse duration at 193, 248, and 308 nm) and a short pulse laser system (500 fs at 248 nm) is reported. Ablation rates range from several hundred nm/pulse (193 nm or fs-laser) up to about 6 μm/pulse (308 nm). The performance of the ablation is found to depend not only on wavelength and pulse duration but also on the existing or laser induced surface quality (e.g., roughness) of the material. Special ablation phenomena are observed. At 193 nm and moderate fluence (3 J/cm2) ablation takes place at the rear side of a plate without affecting the front side, whereas at higher fluence normal ablation at the front side occurs. At 248 nm (standard excimer) the existence of two consecutive ablation phases is observed: smooth ablation at low rate is followed by explosive ablation at high rate. Using fs-pulses smooth shaped holes are formed during the first pulses, whereas high pulse numbers cause the development of a ripple structure in the ablation craters. The results lead to the conclusion that two different ablation mechanisms are involved: the first is based on two photon bulk absorption, the second on controlled surface damage in relation with (partially laser induced) singularity conditions at the surface.

- by Peter Simon
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- Condensed Matter Physics, Fused Silica Etching, Excimer Laser
- by Jeremy Gray
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- Fluorescence Microscopy, Glass, Multidisciplinary, Single molecule
- by Ronald Moore and +1
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- Chemical Engineering, Analytical Chemistry, Water, Mass Spectrometry
- by Ronald Moore
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- Chemical Engineering, Analytical Chemistry, Metabolism, Mass Spectrometry

We report on a new type of permanent damage obtained in bulk fused silica by focusing IR femtosecond laser pulses with microjoule energy. It consists of an uniaxial birefringence zone over a lateral size of a few microns and a depth of a few tens of microns. The birefringence zone is followed by sub-micrometer filamentary cracks extending up to 80 μm. Nonlinear pulse propagation plays a crucial role in the onset of this type of damage.

- by Phan Thuc Dinh
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- Engineering, Technology, Mass Spectrometry, Pepper
- by Hubert Braendle
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- Optics, Medical Imaging, Fiber Optics, Vibrations
- by Guy GARRY
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- Engineering, Materials Engineering, Technology, Applied Physics
- by Alan Arai
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- Fiber Laser, Fused Silica Etching, Second Harmonic Generation, Optical physics
- by Gregory Orcel
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- Engineering, Materials Engineering, Chemical Engineering, Analytical Chemistry

We studied the influence of substrata topography on the behaviour of murine P388D1 macrophage cell line. Cells were plated on plain fused silica substrata or substrata with microfabricated grooves of varying depth and width. Cell spread area, elongation, orientation and F-actin content were measured on plain substratum and 6 sets of gratings. The speed and persistence of cell movement were also studied.We found that patterned substrata substantially activated cell spreading and elongation and significantly increased the persistence and speed of cell movement, shallow grooves being more effective than deep ones. The contact of cells with micropatterned substrata significantly increased the F-actin content in cells. The sensitivity of LPS (lipopolisaccharide) stimulated and unstimulated macrophages to topographical cues was also compared.

- by Christopher Wilkinson
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- Cell Biology, Macrophages, Cell line, Video microscopy

The AOCS Official Method Ce 1h-05 was recently approved at the 96th AOCS Annual Meeting (2005) by the Uniform Methods Committee as the official method for determining cis and trans FA in vegetable or non-ruminant fats and oils. A series of experiments was undertaken using a margarine (hydrogenated soybean oil) sample containing approximately 34% total trans FA (28% 18∶1 trans, 6% 18∶2 trans, and 0.2% 18∶3 trans), a low-trans oil (ca. 7% total trans FA), and a proposed system suitability mixture (12∶0, 9c−18∶1, 11c−18;1, 9c,12c,15c−18∶3, 11c−20∶1, and 21∶0) in an effort to evaluate and optimize the separation on the 100-m SP-2560 and CP-Sil 88 flexible fused-silica capillary GC columns recommended for the analysis. Different carrier gases and flow rates were used during the evaluation, which eventually lead to the final conditions to be used for AOCS Official Method Ce 1h-05.

- by Michael Kennedy
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- Chemical Engineering, Fused Silica Etching, Gas Chromatography, Vegetable oil
- by Doris Vollmer
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- Atomic Force Microscopy, Multidisciplinary, Silica, Fused Silica Etching
- by Jens-Boie Suck
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- Data Analysis, Time of Flight, Physical sciences, Fused Silica Etching
- by Artur Pozarlik
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- Mechanical Engineering, Chemical Engineering, Kinetics, Automotive Engineering
- by alejandro cifuentes
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- Engineering, Technology, Chromatography, Capillary electrophoresis
- by Manabu Tokeshi
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- Chemical Engineering, Analytical Chemistry, Microfluidics, Instrumentation
- by L. Torner
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- Nonlinear Optics, Femtosecond Laser, Temporal dynamics, Physical sciences
- by Ali Said
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- Femtosecond Laser, Integrated Optics, Optical Sensor, Fused Silica Etching
- by Jean Hare
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- Quantum Physics, Cavity Quantum Electrodynamics, Near Infrared, Surface Roughness
- by Hongbing Jiang
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- Quantum Physics, Nonlinear Optics, Femtosecond Laser, Fused Silica Etching
- by Paula Andrade
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- Food Chemistry, Multidisciplinary, Fused Silica Etching, Phenolic compound
- by Salvatore Fanali
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- Engineering, Physical Chemistry, Technology, Capillary electrophoresis
- by Joseph Menapace
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- Materials Engineering, Silica, Optical microscopy, Fused Silica Etching
- by Emirhan Nemutlu
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- Engineering, Analytical Chemistry, Technology, Agriculture
- by Jean Hare
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- New, Physical sciences, Fused Silica Etching, Quantum Dot

Nickel oxide thin films were deposited on fused silica and Si(1 0 0) substrates at different substrate temperatures ranging from room temperature to 400 °C using radio frequency reactive magnetron sputtering from a Ni metal target in a mixture of O2 and Ar. With the increase of substrate temperature, nickel oxide films deposited on the Si substrates exhibit transition from amorphous to poly-crystalline structures with different preferred orientations of NiO(2 0 0) and (1 1 1). The films deposited at higher temperature exhibit higher Ni2+/Ni3+ ratio. With substrate temperature increasing from room temperature to 400 °C, the electrical resistivities of nickel oxide films increase from (2.8 ± 0.1) × 10−2 to (8.7 ± 0.1) Ω cm, and the optical band-gap energies increase from 3.65 to 3.88 eV. A p-nickel oxide/n-zinc oxide heterojunction was fabricated to confirm the p-type conduction of nickel oxide thin film, which exhibited a steadily rectifying behavior.

- by Mingjun Wang
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- Engineering, Multidisciplinary, Thin Films, Zinc Oxide
- by Ulf Peschel
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- Optics, Quantum Physics, Femtosecond Laser, Integrated Optics

An optimized capillary zone electrophoresis (CZE) method for the analysis of tetracycline (TC), chlortetracycline (CTC), oxytetracycline (OTC) and doxycycline (DXC) is described. Using fused-silica capillaries, the influence of the electrolyte composition, pH and concentration, as well as temperature and applied voltage were investigated. A factorial and central composite design was performed to optimize the method in a simple way. The optimal separation conditions were 50 mmol L−1 sodium carbonate + 1 mmol L−1 EDTA, pH 10; voltage 13 kV and temperature 23 °C. The method was validated for TC determination in pharmaceuticals through the following performance criteria: linearity and linear range, sensitivity, selectivity, intra-assay and inter-assay precision, detectability, accuracy and ruggedness. In comparison with the recommended HPLC method in the United States Pharmacopeia, this CZE-method exhibited the same performance as the official method, with the advantage that the same method could be used for the simultaneous determination of the different tetracyclines in pharmaceutical formulations.

- by monica mamani
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- Engineering, Analytical Chemistry, Veterinary Medicine, Technology
- by Laurence Labat
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- Analytical Chemistry, Serotonin, Fused Silica Etching, Analytical Method
- by Vladimir Mezentsev
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- Quantum Physics, Ultrafast Optics, Femtosecond Laser, Optical Waveguides
- by Peter Wolf
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- Quantum Mechanics, Special Relativity, Physical sciences, Fused Silica Etching